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Bubulac, L. O., Tennant, W. E., Shin, S. H., Wang, C. C., Lanir, M., Gertner, E. R., Marshall, E. D. (1980) Ion Implantation Study of HgCdTe. Japanese Journal of Applied Physics, 19. 495 doi:10.7567/jjaps.19s1.495

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Reference TypeJournal (article/letter/editorial)
TitleIon Implantation Study of HgCdTe
JournalJapanese Journal of Applied Physics
AuthorsBubulac, L. O.Author
Tennant, W. E.Author
Shin, S. H.Author
Wang, C. C.Author
Lanir, M.Author
Gertner, E. R.Author
Marshall, E. D.Author
Year1980 (January 1)Volume19
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjaps.19s1.495Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID14983485Long-form Identifiermindat:1:5:14983485:0
GUID0
Full ReferenceBubulac, L. O., Tennant, W. E., Shin, S. H., Wang, C. C., Lanir, M., Gertner, E. R., Marshall, E. D. (1980) Ion Implantation Study of HgCdTe. Japanese Journal of Applied Physics, 19. 495 doi:10.7567/jjaps.19s1.495
Plain TextBubulac, L. O., Tennant, W. E., Shin, S. H., Wang, C. C., Lanir, M., Gertner, E. R., Marshall, E. D. (1980) Ion Implantation Study of HgCdTe. Japanese Journal of Applied Physics, 19. 495 doi:10.7567/jjaps.19s1.495
In(1980) Japanese Journal of Applied Physics Vol. 19. Japan Society of Applied Physics


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