Reference Type | Journal (article/letter/editorial) |
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Title | Chemical Vapor Deposition of CuGaS2Using Chloride Sources |
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Journal | Japanese Journal of Applied Physics |
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Authors | Matsumoto, Takashi | Author |
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Nakanishi, Hiroshi | Author |
Ishida, Tetsuro | Author |
Year | 1987 (August 20) | Volume | 26 |
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Publisher | Japan Society of Applied Physics |
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DOI | doi:10.1143/jjap.26.l1263Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 14989874 | Long-form Identifier | mindat:1:5:14989874:6 |
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GUID | 0 |
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Full Reference | Matsumoto, Takashi, Nakanishi, Hiroshi, Ishida, Tetsuro (1987) Chemical Vapor Deposition of CuGaS2Using Chloride Sources. Japanese Journal of Applied Physics, 26. doi:10.1143/jjap.26.l1263 |
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Plain Text | Matsumoto, Takashi, Nakanishi, Hiroshi, Ishida, Tetsuro (1987) Chemical Vapor Deposition of CuGaS2Using Chloride Sources. Japanese Journal of Applied Physics, 26. doi:10.1143/jjap.26.l1263 |
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In | (1987) Japanese Journal of Applied Physics Vol. 26. Japan Society of Applied Physics |
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