Watanabe, Hiroki, Shimogaki, Yukihiro (2006) Source Gas Dependency of Amorphous Fluorinated Carbon Film Properties Prepared by Plasma Enhanced Chemical Vapor Deposition Using C4F8, C4F6, and C5F8Gases. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l463
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Source Gas Dependency of Amorphous Fluorinated Carbon Film Properties Prepared by Plasma Enhanced Chemical Vapor Deposition Using C4F8, C4F6, and C5F8Gases | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Watanabe, Hiroki | Author | |
| Shimogaki, Yukihiro | Author | ||
| Year | 2006 (April 21) | Volume | 45 |
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.45.l463Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15026677 | Long-form Identifier | mindat:1:5:15026677:0 |
| GUID | 0 | ||
| Full Reference | Watanabe, Hiroki, Shimogaki, Yukihiro (2006) Source Gas Dependency of Amorphous Fluorinated Carbon Film Properties Prepared by Plasma Enhanced Chemical Vapor Deposition Using C4F8, C4F6, and C5F8Gases. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l463 | ||
| Plain Text | Watanabe, Hiroki, Shimogaki, Yukihiro (2006) Source Gas Dependency of Amorphous Fluorinated Carbon Film Properties Prepared by Plasma Enhanced Chemical Vapor Deposition Using C4F8, C4F6, and C5F8Gases. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l463 | ||
| In | (2006) Japanese Journal of Applied Physics Vol. 45. Japan Society of Applied Physics | ||
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