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Momose, Takeshi, Shimogaki, Yukihiro (2006) In SituObservation of Initial Nucleation and Growth of Chemical Vapor Deposition of Copper by Surface Reflectivity Measurement. Japanese Journal of Applied Physics, 45 (11) 8618-8623 doi:10.1143/jjap.45.8618

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Reference TypeJournal (article/letter/editorial)
TitleIn SituObservation of Initial Nucleation and Growth of Chemical Vapor Deposition of Copper by Surface Reflectivity Measurement
JournalJapanese Journal of Applied Physics
AuthorsMomose, TakeshiAuthor
Shimogaki, YukihiroAuthor
Year2006 (November 8)Volume45
Issue11
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.45.8618Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15027222Long-form Identifiermindat:1:5:15027222:1
GUID0
Full ReferenceMomose, Takeshi, Shimogaki, Yukihiro (2006) In SituObservation of Initial Nucleation and Growth of Chemical Vapor Deposition of Copper by Surface Reflectivity Measurement. Japanese Journal of Applied Physics, 45 (11) 8618-8623 doi:10.1143/jjap.45.8618
Plain TextMomose, Takeshi, Shimogaki, Yukihiro (2006) In SituObservation of Initial Nucleation and Growth of Chemical Vapor Deposition of Copper by Surface Reflectivity Measurement. Japanese Journal of Applied Physics, 45 (11) 8618-8623 doi:10.1143/jjap.45.8618
In(2006, November) Japanese Journal of Applied Physics Vol. 45 (11) Japan Society of Applied Physics

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Momose, Takeshi, Sugiyama, Masakazu, Shimogaki, Yukihiro (2008) In situObservation of Initial Nucleation and Growth Processes in Supercritical Fluid Deposition of Copper. Japanese Journal of Applied Physics, 47 (2) 885-890 doi:10.1143/jjap.47.885
Zhao, Bin, Momose, Takeshi, Shimogaki, Yukihiro (2006) Deposition of Cu-Ag Alloy Film by Supercritical Fluid Deposition. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l1296
Kim, Hoon, Kojima, Yasuhiko, Sato, Hiroshi, Yoshii, Naoki, Hosaka, Shigetoshi, Shimogaki, Yukihiro (2006) Influence of Crystal Orientation of Ru Under-Layer on Initial Growth of Copper Chemical Vapor Deposition. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l233
Momose, Takeshi, Sugiyama, Masakazu, Kondoh, Eiichi, Shimogaki, Yukihiro (2010) Step Coverage Quality of Cu Films by Supercritical Fluid Deposition Compared with Chemical Vapor Deposition. Japanese Journal of Applied Physics, 49 (5) 5 doi:10.1143/jjap.49.05ff01
Momose, Takeshi, Sugiyama, Masakazu, Shimogaki, Yukihiro (2005) Precursor Evaluation for Cu-Supercritical Fluid Deposition Based on Adhesion Properties and Surface Morphology. Japanese Journal of Applied Physics, 44. doi:10.1143/jjap.44.l1199
Kajikawa, Yuya, Tsumura, Takeshi, Noda, Suguru, Komiyama, Hiroshi, Shimogaki, Yukihiro (2004) Nucleation of W during Chemical Vapor Deposition from WF6and SiH4. Japanese Journal of Applied Physics, 43 (6) 3945-3950 doi:10.1143/jjap.43.3945
Watanabe, Hiroki, Shimogaki, Yukihiro (2006) Source Gas Dependency of Amorphous Fluorinated Carbon Film Properties Prepared by Plasma Enhanced Chemical Vapor Deposition Using C4F8, C4F6, and C5F8Gases. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l463
Watanabe, Hiroki, Shimogaki, Yukihiro (2006) Preparation and Characterization of Amorphous Fluorinated Carbon Film Using Low-Global-Warming-Potential Gas, C4F6, by Plasma-Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 45 (11) 8624-8628 doi:10.1143/jjap.45.8624
Noda, Suguru, Tsumura, Takeshi, Fukuhara, Jota, Yoda, Takashi, Komiyama, Hiroshi, Shimogaki, Yukihiro (2004) Stranski–Krastanov Growth of Tungsten during Chemical Vapor Deposition Revealed by Micro-Auger Electron Spectroscopy. Japanese Journal of Applied Physics, 43 (10) 6974-6977 doi:10.1143/jjap.43.6974
Watanabe, Hiroki, Tokimitsu, Takumi, Shiga, Jyunko, Haneji, Nobuo, Shimogaki, Yukihiro (2006) Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition. Japanese Journal of Applied Physics, 45. doi:10.1143/jjap.45.l151
Saito, Tatsuro, Momose, Takeshi, Hoshi, Toru, Takai, Madoka, Ishihara, Kazuhiko, Shimogaki, Yukihiro (2010) Surface Modification of SiO2Microchannels with Biocompatible Polymer Using Supercritical Carbon Dioxide. Japanese Journal of Applied Physics, 49 (11) 116503 doi:10.1143/jjap.49.116503
 
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