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Seko, Akiyoshi, Sago, Toshifumi, Sakashita, Mitsuo, Sakai, Akira, Ogawa, Masaki, Zaima, Shigeaki (2006) Characterization of Local Current Leakage in La2O3–Al2O3Composite Films by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 45 (4) 2954-2960 doi:10.1143/jjap.45.2954

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization of Local Current Leakage in La2O3–Al2O3Composite Films by Conductive Atomic Force Microscopy
JournalJapanese Journal of Applied Physics
AuthorsSeko, AkiyoshiAuthor
Sago, ToshifumiAuthor
Sakashita, MitsuoAuthor
Sakai, AkiraAuthor
Ogawa, MasakiAuthor
Zaima, ShigeakiAuthor
Year2006 (April 25)Volume45
Issue4
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.45.2954Search in ResearchGate
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Mindat Ref. ID15027862Long-form Identifiermindat:1:5:15027862:9
GUID0
Full ReferenceSeko, Akiyoshi, Sago, Toshifumi, Sakashita, Mitsuo, Sakai, Akira, Ogawa, Masaki, Zaima, Shigeaki (2006) Characterization of Local Current Leakage in La2O3–Al2O3Composite Films by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 45 (4) 2954-2960 doi:10.1143/jjap.45.2954
Plain TextSeko, Akiyoshi, Sago, Toshifumi, Sakashita, Mitsuo, Sakai, Akira, Ogawa, Masaki, Zaima, Shigeaki (2006) Characterization of Local Current Leakage in La2O3–Al2O3Composite Films by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 45 (4) 2954-2960 doi:10.1143/jjap.45.2954
In(2006, April) Japanese Journal of Applied Physics Vol. 45 (4) Japan Society of Applied Physics

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Sago, Toshifumi, Seko, Akiyoshi, Sakashita, Mitsuo, Sakai, Akira, Ogawa, Masaki, Zaima, Shigeaki (2007) Behavior of Local Charge-Trapping Sites in La2O3–Al2O3Composite Films under Constant Voltage Stress. Japanese Journal of Applied Physics, 46 (4) 1879-1884 doi:10.1143/jjap.46.1879
Seko, Akiyoshi, Watanabe, Yukihiko, Kondo, Hiroki, Sakai, Akira, Zaima, Shigeaki, Yasuda, Yukio (2004) Behavior of Local Current Leakage in Stressed Gate SiO2Films Analyzed by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 43 (7) 4683-4686 doi:10.1143/jjap.43.4683
Ikeda, Hiroya, Goto, Tomokazu, Sakashita, Mitsuo, Sakai, Akira, Zaima, Shigeaki, Yasuda, Yukio (2003) Local Leakage Current of HfO2Thin Films Characterized by Conducting Atomic Force Microscopy. Japanese Journal of Applied Physics, 42. 1949-1953 doi:10.1143/jjap.42.1949
Watanabe, Yukihiko, Seko, Akiyoshi, Kondo, Hiroki, Sakai, Akira, Zaima, Shigeaki, Yasuda, Yukio (2004) Conductive Atomic Force Microscopy Analysis for Local Electrical Characteristics in Stressed SiO2Gate Films. Japanese Journal of Applied Physics, 43 (4) 1843-1847 doi:10.1143/jjap.43.1843
Watanabe, Yukihiko, Seko, Akiyoshi, Kondo, Hiroki, Sakai, Akira, Zaima, Shigeaki, Yasuda, Yukio (2004) Microscopic Analysis of Stress-Induced Leakage Current in Stressed Gate SiO2Films Using Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 43. doi:10.1143/jjap.43.l144
Adachi, Masaki, Kato, Yuzo, Kato, Kimihiko, Sakashita, Mitsuo, Kondo, Hiroki, Takeuchi, Wakana, Nakatsuka, Osamu, Zaima, Shigeaki (2011) Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04da08
Seko, Akiyoshi, Watanabe, Yukihiko, Kondo, Hiroki, Sakai, Akira, Zaima, Shigeaki, Yasuda, Yukio (2005) Analysis of Local Breakdown Process in Stressed Gate SiO2Films by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 44 (10) 7582-7587 doi:10.1143/jjap.44.7582
Adachi, Masaki, Kato, Yuzo, Kato, Kimihiko, Sakashita, Mitsuo, Kondo, Hiroki, Takeuchi, Wakana, Nakatsuka, Osamu, Zaima, Shigeaki (2011) Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.7567/jjap.50.04da08
Fujitsuka, Ryota, Sakashita, Mitsuo, Sakai, Akira, Ogawa, Masaki, Zaima, Shigeaki, Yasuda, Yukio (2005) Thermal Stability and Electrical Properties of (La2O3)1-x(Al2O3)xComposite Films. Japanese Journal of Applied Physics, 44 (4) 2428-2432 doi:10.1143/jjap.44.2428
Watanabe, Yukihiko, Seko, Akiyoshi, Kondo, Hiroki, Sakai, Akira, Zaima, Shigeaki, Yasuda, Yukio (2004) Detection and Characterization of Stress-Induced Defects in Gate SiO2Films by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 43 (7) 4679-4682 doi:10.1143/jjap.43.4679
Ariyoshi, Keiko, Sakashita, Mitsuo, Sakai, Akira, Ogawa, Masaki, Zaima, Shigeaki (2006) Film Structures and Electrical Properties of Pr Silicate Formed by Pulsed Laser Deposition. Japanese Journal of Applied Physics, 45 (4) 2903-2907 doi:10.1143/jjap.45.2903
 
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