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Adachi, Masaki, Kato, Yuzo, Kato, Kimihiko, Sakashita, Mitsuo, Kondo, Hiroki, Takeuchi, Wakana, Nakatsuka, Osamu, Zaima, Shigeaki (2011) Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.7567/jjap.50.04da08

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Reference TypeJournal (article/letter/editorial)
TitleAnalysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy
JournalJapanese Journal of Applied Physics
AuthorsAdachi, MasakiAuthor
Kato, YuzoAuthor
Kato, KimihikoAuthor
Sakashita, MitsuoAuthor
Kondo, HirokiAuthor
Takeuchi, WakanaAuthor
Nakatsuka, OsamuAuthor
Zaima, ShigeakiAuthor
Year2011 (April 1)Volume50
Issue4
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.50.04da08Search in ResearchGate
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Mindat Ref. ID15037900Long-form Identifiermindat:1:5:15037900:5
GUID0
Full ReferenceAdachi, Masaki, Kato, Yuzo, Kato, Kimihiko, Sakashita, Mitsuo, Kondo, Hiroki, Takeuchi, Wakana, Nakatsuka, Osamu, Zaima, Shigeaki (2011) Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.7567/jjap.50.04da08
Plain TextAdachi, Masaki, Kato, Yuzo, Kato, Kimihiko, Sakashita, Mitsuo, Kondo, Hiroki, Takeuchi, Wakana, Nakatsuka, Osamu, Zaima, Shigeaki (2011) Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.7567/jjap.50.04da08
In(2011, April) Japanese Journal of Applied Physics Vol. 50 (4) Japan Society of Applied Physics

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Kato, Kimihiko, Asano, Takanori, Taoka, Noriyuki, Sakashita, Mitsuo, Takeuchi, Wakana, Nakatsuka, Osamu, Zaima, Shigeaki (2014) Robustness of Sn precipitation during thermal oxidation of Ge1−xSnxon Ge(001) Japanese Journal of Applied Physics, 53 (8) 8 doi:10.7567/jjap.53.08ld04
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Seko, Akiyoshi, Sago, Toshifumi, Sakashita, Mitsuo, Sakai, Akira, Ogawa, Masaki, Zaima, Shigeaki (2006) Characterization of Local Current Leakage in La2O3–Al2O3Composite Films by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics, 45 (4) 2954-2960 doi:10.1143/jjap.45.2954
Takeuchi, Kusumandari, Kato, Kimihiko, Shibayama, Shigehisa, Sakashita, Mitsuo, Nakatsuka, Osamu, Zaima, Shigeaki (2012) Characterization of Damage of Al2O3/Ge Gate Stack Structure Induced with Light Radiation during Plasma Nitridation. Japanese Journal of Applied Physics, 51 (1) 1 doi:10.7567/jjap.51.01aj01
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