Okamoto, Koichiro, Tada, Munehiro, Ito, Kimihiko, Hada, Hiromitsu (2011) Improved Resistive Switching Characteristics of NiO Resistance Random-Access Memory Using Post-Plasma-Oxidation Process. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04dd13
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Improved Resistive Switching Characteristics of NiO Resistance Random-Access Memory Using Post-Plasma-Oxidation Process | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Okamoto, Koichiro | Author | |
Tada, Munehiro | Author | ||
Ito, Kimihiko | Author | ||
Hada, Hiromitsu | Author | ||
Year | 2011 (April 20) | Volume | 50 |
Issue | 4 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.1143/jjap.50.04dd13Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15037708 | Long-form Identifier | mindat:1:5:15037708:7 |
GUID | 0 | ||
Full Reference | Okamoto, Koichiro, Tada, Munehiro, Ito, Kimihiko, Hada, Hiromitsu (2011) Improved Resistive Switching Characteristics of NiO Resistance Random-Access Memory Using Post-Plasma-Oxidation Process. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04dd13 | ||
Plain Text | Okamoto, Koichiro, Tada, Munehiro, Ito, Kimihiko, Hada, Hiromitsu (2011) Improved Resistive Switching Characteristics of NiO Resistance Random-Access Memory Using Post-Plasma-Oxidation Process. Japanese Journal of Applied Physics, 50 (4) 4 doi:10.1143/jjap.50.04dd13 | ||
In | (2011, April) Japanese Journal of Applied Physics Vol. 50 (4) Japan Society of Applied Physics |
See Also
These are possibly similar items as determined by title/reference text matching only.