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Wang, C.M., Saraf, L.V., Hubler, T.L., Nachimuthu, P. (2008) Tilted domain growth of metalorganic chemical vapor (MOCVD)-grown ZnO(0001) on α-Al2O3(0001) Journal of Materials Research, 23 (1) 13-17 doi:10.1557/jmr.2008.0026

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Reference TypeJournal (article/letter/editorial)
TitleTilted domain growth of metalorganic chemical vapor (MOCVD)-grown ZnO(0001) on α-Al2O3(0001)
JournalJournal of Materials Research
AuthorsWang, C.M.Author
Saraf, L.V.Author
Hubler, T.L.Author
Nachimuthu, P.Author
Year2008 (January)Volume23
Issue1
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1557/jmr.2008.0026Search in ResearchGate
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Mindat Ref. ID17104088Long-form Identifiermindat:1:5:17104088:5
GUID0
Full ReferenceWang, C.M., Saraf, L.V., Hubler, T.L., Nachimuthu, P. (2008) Tilted domain growth of metalorganic chemical vapor (MOCVD)-grown ZnO(0001) on α-Al2O3(0001) Journal of Materials Research, 23 (1) 13-17 doi:10.1557/jmr.2008.0026
Plain TextWang, C.M., Saraf, L.V., Hubler, T.L., Nachimuthu, P. (2008) Tilted domain growth of metalorganic chemical vapor (MOCVD)-grown ZnO(0001) on α-Al2O3(0001) Journal of Materials Research, 23 (1) 13-17 doi:10.1557/jmr.2008.0026
In(2008, January) Journal of Materials Research Vol. 23 (1) Springer Science and Business Media LLC

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