| Reference Type | Journal (article/letter/editorial) |
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| Title | Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness Limitations |
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| Journal | Chemistry of Materials |
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| Authors | Kim, Taeseok | Author |
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| Kim, Han | Author |
| Ryu, Seung Ho | Author |
| Park, Gwang Min | Author |
| Kim, Sung-Chul | Author |
| Lee, Sung Kwang | Author |
| Chung, Taek-Mo | Author |
| Won, Sung Ok | Author |
| Han, Jeong Hwan | Author |
| Kim, Sangtae | Author |
| Kim, Seong Keun | Author |
| Year | 2025 (January 28) | Volume | 37 |
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| Issue | 2 |
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| Publisher | American Chemical Society (ACS) |
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| DOI | doi:10.1021/acs.chemmater.4c03298Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 17967502 | Long-form Identifier | mindat:1:5:17967502:7 |
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| GUID | 0 |
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| Full Reference | Kim, Taeseok, Kim, Han, Ryu, Seung Ho, Park, Gwang Min, Kim, Sung-Chul, Lee, Sung Kwang, Chung, Taek-Mo, Won, Sung Ok, Han, Jeong Hwan, Kim, Sangtae, et al. (2025) Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness Limitations. Chemistry of Materials, 37 (2). doi:10.1021/acs.chemmater.4c03298 |
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| Plain Text | Kim, Taeseok, Kim, Han, Ryu, Seung Ho, Park, Gwang Min, Kim, Sung-Chul, Lee, Sung Kwang, Chung, Taek-Mo, Won, Sung Ok, Han, Jeong Hwan, Kim, Sangtae, et al. (2025) Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness Limitations. Chemistry of Materials, 37 (2). doi:10.1021/acs.chemmater.4c03298 |
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| In | (2025, January) Chemistry of Materials Vol. 37 (2). American Chemical Society (ACS) |
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These are the references the publisher has listed as being connected to the article. Please check the article itself for the full list of references which may differ. Not all references are currently linkable within the Digital Library.
| Not Yet Imported: - journal-article : 10.1002/adfm.201400338
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| Not Yet Imported: - journal-article : 10.1002/adfm.201101996
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| Not Yet Imported: - journal-article : 10.1016/j.actamat.2008.11.028
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| |
| Kim, Seong Keun, Choi, Gyu-Jin, Lee, Sang Young, Seo, Minha, Lee, Sang Woon, Han, Jeong Hwan, Ahn, Hyo-Shin, Han, Seungwu, Hwang, Cheol Seong (2008) Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors. Advanced Materials, 20. 1429-1435 doi:10.1002/adma.200701085 |
| Kim, Taikyu, Jeon, Jihoon, Ryu, Seung Ho, Chung, Hong Keun, Jang, Myoungsu, Lee, Seunghyeok, Chung, Yoon Jang, Kim, Seong Keun (2024) Atomic Layer Growth of Rutile TiO2 Films with Ultrahigh Dielectric Constants via Crystal Orientation Engineering. ACS Applied Materials & Interfaces, 16 (26) 33877-33884 doi:10.1021/acsami.4c08379 |
| Jeon, Jihoon, Kim, Taikyu, Jang, Myoungsu, Chung, Hong Keun, Kim, Sung-Chul, Won, Sung Ok, Park, Yongjoo, Choi, Byung Joon, Chung, Yoon Jang, Kim, Seong Keun (2024) High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance. Chemistry of Materials, 36 (7) 3326-3333 doi:10.1021/acs.chemmater.3c03324 |
| Not Yet Imported: - journal-article : 10.1002/adfm.201000599
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| Not Yet Imported: - journal-article : 10.1002/adfm.201103119
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| Hoffmann, M., Schroeder, U., Schenk, T., Shimizu, T., Funakubo, H., Sakata, O., Pohl, D., Drescher, M., Adelmann, C., Materlik, R., Kersch, A., Mikolajick, T. (2015) Stabilizing the ferroelectric phase in doped hafnium oxide. Journal of Applied Physics, 118 (7). 72006pp. doi:10.1063/1.4927805 |
| Cho, Ah-Jin, Jeon, Jihoon, Chung, Hong Keun, Baek, In-Hwan, Yang, Kun, Park, Min Hyuk, Baek, Seung-Hyub, Kim, Seong Keun (2022) Effects of oxygen sources on properties of atomic-layer-deposited ferroelectric hafnium zirconium oxide thin films. Ceramics International, 48 (3) 3280-3286 doi:10.1016/j.ceramint.2021.10.102 |
| Not Yet Imported: - journal-article : 10.1039/C7TC01200D
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| Wu, Yizhi, Giddings, A. Devin, Verheijen, Marcel A., Macco, Bart, Prosa, Ty J., Larson, David J., Roozeboom, Fred, Kessels, Wilhelmus M. M. (2018) Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography. Chemistry of Materials, 30. 1209-1217 doi:10.1021/acs.chemmater.7b03501 |
| Not Yet Imported: - journal-article : 10.1002/adfm.201001342
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| Not Yet Imported: - journal-article : 10.1002/cvde.200306265
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| Mackus, Adriaan J. M., Schneider, Joel R., MacIsaac, Callisto, Baker, Jon G., Bent, Stacey F. (2019) Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review. Chemistry of Materials, 31. 1142-1183 doi:10.1021/acs.chemmater.8b02878 |
| Not Yet Imported: - journal-article : 10.1039/c3tc30469h
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| Not Yet Imported: - journal-article : 10.1149/1.2909768
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| Cho, Cheol Jin, Pyeon, Jung Joon, Hwang, Cheol Seong, Kim, Jin-Sang, Kim, Seong Keun (2019) Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applications. Applied Surface Science, 497. 143804pp. doi:10.1016/j.apsusc.2019.143804 |
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| Wu, Y., Potts, S. E., Hermkens, P. M., Knoops, H. C. M., Roozeboom, F., Kessels, W. M. M. (2013) Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor. Chemistry of Materials, 25. 4619-4622 doi:10.1021/cm402974j |
| Van, T. T., Hoang, J., Ostroumov, R., Wang, K. L., Bargar, J. R., Lu, J., Blom, H.-O., Chang, J. P. (2006) Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits. Journal of Applied Physics, 100 (7). 73512pp. doi:10.1063/1.2349477 |
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| Yu, Pengmei, Merkx, Marc J.M., Tezsevin, Ilker, Lemaire, Paul C., Hausmann, Dennis M., Sandoval, Tania E., Kessels, Wilhelmus M.M., Mackus, Adriaan J.M. (2024) Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation. Applied Surface Science, 665. 160141 doi:10.1016/j.apsusc.2024.160141 |
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| Takamoto, So, Shinagawa, Chikashi, Motoki, Daisuke, Nakago, Kosuke, Li, Wenwen, Kurata, Iori, Watanabe, Taku, Yayama, Yoshihiro, Iriguchi, Hiroki, Asano, Yusuke, Onodera, Tasuku, Ishii, Takafumi, Kudo, Takao, Ono, Hideki, Sawada, Ryohto, Ishitani, Ryuichiro, Ong, Marc, Yamaguchi, Taiki, Kataoka, Toshiki, Hayashi, Akihide, Charoenphakdee, Nontawat, Ibuka, Takeshi (2022) Towards universal neural network potential for material discovery applicable to arbitrary combination of 45 elements. Nature Communications, 13 (1) doi:10.1038/s41467-022-30687-9 |
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