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Hultman, L., Barnett, S.A., Sundgren, J.-E., Greene, J.E. (1988) Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition. Journal of Crystal Growth, 92 (3). 639-656 doi:10.1016/0022-0248(88)90048-6

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Reference TypeJournal (article/letter/editorial)
TitleGrowth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition
JournalJournal of Crystal Growth
AuthorsHultman, L.Author
Barnett, S.A.Author
Sundgren, J.-E.Author
Greene, J.E.Author
Year1988 (October)Volume92
Issue3
PublisherElsevier BV
DOIdoi:10.1016/0022-0248(88)90048-6Search in ResearchGate
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Mindat Ref. ID2783188Long-form Identifiermindat:1:5:2783188:1
GUID0
Full ReferenceHultman, L., Barnett, S.A., Sundgren, J.-E., Greene, J.E. (1988) Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition. Journal of Crystal Growth, 92 (3). 639-656 doi:10.1016/0022-0248(88)90048-6
Plain TextHultman, L., Barnett, S.A., Sundgren, J.-E., Greene, J.E. (1988) Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition. Journal of Crystal Growth, 92 (3). 639-656 doi:10.1016/0022-0248(88)90048-6
In(1988, October) Journal of Crystal Growth Vol. 92 (3) Elsevier BV


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