Sarma, Bimal K., Pal, Arup R., Bailung, Heremba, Chutia, Joyanti (2013) Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering. Materials Chemistry and Physics, 139. 979-987 doi:10.1016/j.matchemphys.2013.03.002
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering | ||
Journal | Materials Chemistry and Physics | ||
Authors | Sarma, Bimal K. | Author | |
Pal, Arup R. | Author | ||
Bailung, Heremba | Author | ||
Chutia, Joyanti | Author | ||
Year | 2013 (May) | Volume | 139 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.matchemphys.2013.03.002Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 3060263 | Long-form Identifier | mindat:1:5:3060263:2 |
GUID | 0 | ||
Full Reference | Sarma, Bimal K., Pal, Arup R., Bailung, Heremba, Chutia, Joyanti (2013) Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering. Materials Chemistry and Physics, 139. 979-987 doi:10.1016/j.matchemphys.2013.03.002 | ||
Plain Text | Sarma, Bimal K., Pal, Arup R., Bailung, Heremba, Chutia, Joyanti (2013) Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering. Materials Chemistry and Physics, 139. 979-987 doi:10.1016/j.matchemphys.2013.03.002 | ||
In | (2013, May) Materials Chemistry and Physics Vol. 139 (2) Elsevier BV |
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