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Sarma, Bimal K, Pal, Arup R, Bailung, Heremba, Chutia, Joyanti (2012) A hybrid heterojunction with reverse rectifying characteristics fabricated by magnetron sputtered TiOxand plasma polymerized aniline structure. Journal of Physics D: Applied Physics, 45. 275401pp. doi:10.1088/0022-3727/45/27/275401

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Reference TypeJournal (article/letter/editorial)
TitleA hybrid heterojunction with reverse rectifying characteristics fabricated by magnetron sputtered TiOxand plasma polymerized aniline structure
JournalJournal of Physics D: Applied Physics
AuthorsSarma, Bimal KAuthor
Pal, Arup RAuthor
Bailung, HerembaAuthor
Chutia, JoyantiAuthor
Year2012 (July 11)Volume45
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/45/27/275401Search in ResearchGate
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Mindat Ref. ID5679929Long-form Identifiermindat:1:5:5679929:3
GUID0
Full ReferenceSarma, Bimal K, Pal, Arup R, Bailung, Heremba, Chutia, Joyanti (2012) A hybrid heterojunction with reverse rectifying characteristics fabricated by magnetron sputtered TiOxand plasma polymerized aniline structure. Journal of Physics D: Applied Physics, 45. 275401pp. doi:10.1088/0022-3727/45/27/275401
Plain TextSarma, Bimal K, Pal, Arup R, Bailung, Heremba, Chutia, Joyanti (2012) A hybrid heterojunction with reverse rectifying characteristics fabricated by magnetron sputtered TiOxand plasma polymerized aniline structure. Journal of Physics D: Applied Physics, 45. 275401pp. doi:10.1088/0022-3727/45/27/275401
In(2012) Journal of Physics D: Applied Physics Vol. 45. IOP Publishing

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Pal, Arup R, Sarma, Bimal K., Adhikary, Nirab C., Chutia, Joyanti, Bailung, Heremba (2011) TiO2/polyaniline nanocomposite films prepared by magnetron sputtering combined with plasma polymerization process. Applied Surface Science, 258. 1199-1205 doi:10.1016/j.apsusc.2011.09.071
Borah, Sankar Moni, Bailung, Heremba, Pal, Arup Ratan, Chutia, Joyanti (2008) Study on the influence of nitrogen on titanium nitride in a dc post magnetron sputtering plasma system. Journal of Physics D: Applied Physics, 41. 195205pp. doi:10.1088/0022-3727/41/19/195205
Sarma, Bimal K., Pal, Arup R., Bailung, Heremba, Chutia, Joyanti (2013) Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering. Materials Chemistry and Physics, 139. 979-987 doi:10.1016/j.matchemphys.2013.03.002
Sarma, Bimal K., Pal, Arup R., Bailung, Heremba, Chutia, Joyanti (2012) Role of ion energy on growth and optical dispersion of nanocrystalline TiO2 films prepared by magnetron sputtering with ion assistance at the substrate. Applied Surface Science, 258. 5659-5665 doi:10.1016/j.apsusc.2012.02.051
Sharma, Shyamalima, Pal, Arup R., Chutia, Joyanti, Bailung, Heremba, Sarma, Neelotpal S., Dass, Narendra N., Patil, Dinkar (2012) Plasma process for development of a bulk heterojunction optoelectronic device: A highly sensitive UV detector. Applied Surface Science, 258. 7897-7906 doi:10.1016/j.apsusc.2012.04.115
Borah, Sankar Moni, Pal, Arup Ratan, Bailung, Heremba, Chutia, Joyanti (2011) Effect of E × B electron drift and plasma discharge in dc magnetron sputtering plasma. Chinese Physics B, 20. 14701pp. doi:10.1088/1674-1056/20/1/014701
Kakati, H, Pal, A R, Bailung, H, Chutia, Joyanti (2007) Investigation of theE×Brotation of electrons and related plasma characteristics in a radio frequency magnetron sputtering discharge. Journal of Physics D: Applied Physics, 40. 6865-6872 doi:10.1088/0022-3727/40/22/002
Hussain, Amreen Ara, Pal, Arup Ratan, Bailung, Heremba, Chutia, Joyanti, Patil, Dinkar S (2013) Fabrication of a heterostructure device with Au/PPani–TiO2/ITO configuration and study of device parameters including current conduction mechanism. Journal of Physics D: Applied Physics, 46. 325301pp. doi:10.1088/0022-3727/46/32/325301
Farid, Ibnul, Boruah, Abhijit, Chutia, Joyanti, Pal, Arup Ratan, Bailung, Heremba (2019) Low loaded platinum (Pt) based binary catalyst electrode for PEMFC by plasma co-sputtered deposition method. Materials Chemistry and Physics, 236. 121796pp. doi:10.1016/j.matchemphys.2019.121796
Sarma, Bimal K., Pal, Arup R., Bailung, Heremba, Chutia, Joyanti (2013) Effect of post-deposition annealing on the growth of nanocrystalline TiO2 thin films and elastic anisotropy of rutile phase at different temperatures. Journal of Alloys and Compounds, 577. 261-268 doi:10.1016/j.jallcom.2013.05.137
Boruah, D, Pal, A R, Bailung, H, Chutia, Joyanti (2003) Investigation of sheath properties in Ar/SF6dc discharge plasma. Journal of Physics D: Applied Physics, 36. 645-652 doi:10.1088/0022-3727/36/6/306
 
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