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Wang, Lianwei, Fu, Ricky K. Y., Zeng, Xuchu, Chu, Paul K., Cheung, W. Y., Wong, S. P. (2001) Damage in hydrogen plasma implanted silicon. Journal of Applied Physics, 90 (4). 1735-1739 doi:10.1063/1.1389073

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Reference TypeJournal (article/letter/editorial)
TitleDamage in hydrogen plasma implanted silicon
JournalJournal of Applied Physics
AuthorsWang, LianweiAuthor
Fu, Ricky K. Y.Author
Zeng, XuchuAuthor
Chu, Paul K.Author
Cheung, W. Y.Author
Wong, S. P.Author
Year2001 (August 15)Volume90
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.1389073Search in ResearchGate
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Mindat Ref. ID5110131Long-form Identifiermindat:1:5:5110131:4
GUID0
Full ReferenceWang, Lianwei, Fu, Ricky K. Y., Zeng, Xuchu, Chu, Paul K., Cheung, W. Y., Wong, S. P. (2001) Damage in hydrogen plasma implanted silicon. Journal of Applied Physics, 90 (4). 1735-1739 doi:10.1063/1.1389073
Plain TextWang, Lianwei, Fu, Ricky K. Y., Zeng, Xuchu, Chu, Paul K., Cheung, W. Y., Wong, S. P. (2001) Damage in hydrogen plasma implanted silicon. Journal of Applied Physics, 90 (4). 1735-1739 doi:10.1063/1.1389073
In(2001, August) Journal of Applied Physics Vol. 90 (4) AIP Publishing

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Chu, Paul K., Fu, Ricky K. Y., Zeng, Xuchu, Kwok, Dixon T. K. (2001) Metallic contamination in hydrogen plasma immersion ion implantation of silicon. Journal of Applied Physics, 90 (8). 3743-3749 doi:10.1063/1.1404422
Zeng, Xuchu, Fu, Ricky K. Y., Kwok, Dixon T. K., Chu, Paul K. (2001) Quasi-direct current plasma immersion ion implantation. Applied Physics Letters, 79 (19). 3044-3046 doi:10.1063/1.1415404
Liu, Xuanyong, Fu, Ricky K. Y., Chu, Paul K., Ding, Chuanxian (2004) Mechanism of apatite formation on hydrogen plasma-implanted single-crystal silicon. Applied Physics Letters, 85 (16). 3623-3625 doi:10.1063/1.1807009
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An, Zhenghua, Wu, Yanjun, Zhang, Miao, Di, Zengfeng, Lin, Chenglu, Fu, Ricky K. Y., Chen, Peng, Chu, Paul K., Cheung, W. Y., Wong, S. P. (2003) Relaxed silicon–germanium-on-insulator substrates by oxygen implantation into pseudomorphic silicon germanium/silicon heterostructure. Applied Physics Letters, 82 (15). 2452-2454 doi:10.1063/1.1567807
Tong, Honghui, Fu, Ricky K. Y., Tang, Deli, Zeng, Xuchu, Chu, Paul K. (2002) Effects of magnetic field on pulse wave forms in plasma immersion ion implantation in a radio-frequency, inductively coupled plasma. Journal of Applied Physics, 92 (5). 2284-2289 doi:10.1063/1.1499983
An, Zhenghua, Fu, Ricky K. Y., Li, Weili, Chen, Peng, Chu, Paul K., Li, K. F., Luo, L., Tam, H. L., Cheah, K. W., Lin, Chenglu (2004) Low-temperature photoluminescence of hydrogen Ion and plasma implanted silicon and porous silicon. Journal of Applied Physics, 96 (1). 248-251 doi:10.1063/1.1759784
Liu, Weili, Zhang, Miao, Lin, Chenglu, Zeng, Zhaoming, Wang, Lianwei, Chu, Paul K. (2001) Intense blue-light emission from carbon-plasma-implanted porous silicon. Applied Physics Letters, 78 (1). 37-39 doi:10.1063/1.1337622
Lu, Qiu Yuan, Wang, Zhuo, Li, Liu He, Fu, Ricky K. Y., Chu, Paul. K. (2010) Ion focusing in enhanced glow discharge plasma immersion ion implantation of hydrogen and nitrogen into silicon. Journal of Applied Physics, 108 (3). 33304pp. doi:10.1063/1.3467967
Tian, Xiubo, Fu, Ricky K.Y., Wang, Lianwei, Chu, Paul K. (2001) Oxygen-induced nickel segregation in nitrogen plasma implanted AISI 304 stainless steel. Materials Science and Engineering: A, 316. 200-204 doi:10.1016/s0921-5093(01)01245-x
Kwok, Dixon T. K., Pu, Shihao, Fu, Ricky K. Y., Jin, Fanya, Chu, Paul K. (2007) Dependence of ion sheath collapse on secondary electron emission in plasma immersion ion implantation. Applied Physics Letters, 90 (13). 131503pp. doi:10.1063/1.2717082
 
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