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Gonon, P., Sylvestre, A. (2002) Dielectric properties of fluorocarbon thin films deposited by radio frequency sputtering of polytetrafluoroethylene. Journal of Applied Physics, 92 (8). 4584-4589 doi:10.1063/1.1505983

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Reference TypeJournal (article/letter/editorial)
TitleDielectric properties of fluorocarbon thin films deposited by radio frequency sputtering of polytetrafluoroethylene
JournalJournal of Applied Physics
AuthorsGonon, P.Author
Sylvestre, A.Author
Year2002 (October 15)Volume92
Issue8
PublisherAIP Publishing
DOIdoi:10.1063/1.1505983Search in ResearchGate
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Mindat Ref. ID5117039Long-form Identifiermindat:1:5:5117039:6
GUID0
Full ReferenceGonon, P., Sylvestre, A. (2002) Dielectric properties of fluorocarbon thin films deposited by radio frequency sputtering of polytetrafluoroethylene. Journal of Applied Physics, 92 (8). 4584-4589 doi:10.1063/1.1505983
Plain TextGonon, P., Sylvestre, A. (2002) Dielectric properties of fluorocarbon thin films deposited by radio frequency sputtering of polytetrafluoroethylene. Journal of Applied Physics, 92 (8). 4584-4589 doi:10.1063/1.1505983
In(2002, October) Journal of Applied Physics Vol. 92 (8) AIP Publishing

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