Reference Type | Journal (article/letter/editorial) |
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Title | Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image |
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Journal | Journal of Applied Physics |
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Authors | Wang, Jingquan | Author |
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Liang, Huimin | Author |
Year | 2013 (June 21) | Volume | 113 |
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Issue | 23 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.4811530Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5193293 | Long-form Identifier | mindat:1:5:5193293:6 |
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GUID | 0 |
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Full Reference | Wang, Jingquan, Liang, Huimin (2013) Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image. Journal of Applied Physics, 113 (23). 233101pp. doi:10.1063/1.4811530 |
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Plain Text | Wang, Jingquan, Liang, Huimin (2013) Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image. Journal of Applied Physics, 113 (23). 233101pp. doi:10.1063/1.4811530 |
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In | (2013, June) Journal of Applied Physics Vol. 113 (23) AIP Publishing |
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