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Sreekanth, K. V., Murukeshan, V. M., Chua, J. K. (2008) A planar layer configuration for surface plasmon interference nanoscale lithography. Applied Physics Letters, 93 (9). 93103pp. doi:10.1063/1.2976630

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Reference TypeJournal (article/letter/editorial)
TitleA planar layer configuration for surface plasmon interference nanoscale lithography
JournalApplied Physics Letters
AuthorsSreekanth, K. V.Author
Murukeshan, V. M.Author
Chua, J. K.Author
Year2008 (September)Volume93
Issue9
PublisherAIP Publishing
DOIdoi:10.1063/1.2976630Search in ResearchGate
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Mindat Ref. ID8571806Long-form Identifiermindat:1:5:8571806:7
GUID0
Full ReferenceSreekanth, K. V., Murukeshan, V. M., Chua, J. K. (2008) A planar layer configuration for surface plasmon interference nanoscale lithography. Applied Physics Letters, 93 (9). 93103pp. doi:10.1063/1.2976630
Plain TextSreekanth, K. V., Murukeshan, V. M., Chua, J. K. (2008) A planar layer configuration for surface plasmon interference nanoscale lithography. Applied Physics Letters, 93 (9). 93103pp. doi:10.1063/1.2976630
In(2008, September) Applied Physics Letters Vol. 93 (9) AIP Publishing

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Sreekanth, Kandammathe Valiyaveedu, Chua, Jeun Kee, Murukeshan, Vadakke Matham (2010) Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference. Applied Optics, 49. 6710pp. doi:10.1364/ao.49.006710
Chua, J K, Murukeshan, V M (2009) Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography. Physica Scripta, 80 (1). 15401pp. doi:10.1088/0031-8949/80/01/015401
Sreekanth, K. V., Murukeshan, V. M. (2010) Effect of metals on UV-excited plasmonic lithography for sub-50 nm periodic feature fabrication. Applied Physics A, 101. 117-120 doi:10.1007/s00339-010-5769-y
Sathiyamoorthy, K, Sreekanth, K V, Sidharthan, R, Murukeshan, V M, Xing, Bengang (2011) Surface plasmon enhancement in gold nanoparticles in the presence of an optical gain medium: an analysis. Journal of Physics D: Applied Physics, 44. 425102pp. doi:10.1088/0022-3727/44/42/425102
Sreekanth, K. V., Sidharthan, R., Murukeshan, V. M. (2011) Gap modes assisted enhanced broadband light absorption in plasmonic thin film solar cell. Journal of Applied Physics, 110 (3). 33107pp. doi:10.1063/1.3622149
Shadrin, A. V., Constantinian, K. Y., Ovsyannikov, G. A., Shitov, S. V., Soloviev, I. I., Kornev, V. K., Mygind, J. (2008) Fraunhofer regime of operation for superconducting quantum interference filters. Applied Physics Letters, 93 (26). 262503pp. doi:10.1063/1.3058759
Goldstein, M., WĂĽest, A., Barnhart, D. (2008) Partially coherent extreme ultraviolet interference lithography for 16nm patterning research. Applied Physics Letters, 93 (8). 83110pp. doi:10.1063/1.2973178
Gambaryan, K. M., Aroutiounian, V. M., Harutyunyan, V. G. (2012) Nucleation features and energy levels of type-II InAsSbP quantum dots grown on InAs(100) substrate. Applied Physics Letters, 101 (9). 93103pp. doi:10.1063/1.4748574
Imre, A., Vlasko-Vlasov, V. K., Pearson, J., Hiller, J. M., Welp, U. (2007) Multiplexing surface plasmon polaritons on nanowires. Applied Physics Letters, 91 (8). 83115pp. doi:10.1063/1.2773992
Macías, D., Vial, A. (2008) Optimal design of plasmonic nanostructures for plasmon-interference assisted lithography. Applied Physics B, 93 (1). 159-163 doi:10.1007/s00340-008-3194-0
Catchpole, K. R., Polman, A. (2008) Design principles for particle plasmon enhanced solar cells. Applied Physics Letters, 93 (19). 191113pp. doi:10.1063/1.3021072
 
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