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Goldstein, M., Wüest, A., Barnhart, D. (2008) Partially coherent extreme ultraviolet interference lithography for 16nm patterning research. Applied Physics Letters, 93 (8). 83110pp. doi:10.1063/1.2973178

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Reference TypeJournal (article/letter/editorial)
TitlePartially coherent extreme ultraviolet interference lithography for 16nm patterning research
JournalApplied Physics Letters
AuthorsGoldstein, M.Author
Wüest, A.Author
Barnhart, D.Author
Year2008 (August 25)Volume93
Issue8
PublisherAIP Publishing
DOIdoi:10.1063/1.2973178Search in ResearchGate
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Mindat Ref. ID8571572Long-form Identifiermindat:1:5:8571572:3
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Full ReferenceGoldstein, M., Wüest, A., Barnhart, D. (2008) Partially coherent extreme ultraviolet interference lithography for 16nm patterning research. Applied Physics Letters, 93 (8). 83110pp. doi:10.1063/1.2973178
Plain TextGoldstein, M., Wüest, A., Barnhart, D. (2008) Partially coherent extreme ultraviolet interference lithography for 16nm patterning research. Applied Physics Letters, 93 (8). 83110pp. doi:10.1063/1.2973178
In(2008, August) Applied Physics Letters Vol. 93 (8) AIP Publishing

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Wang, Li, Terhalle, Bernd, Guzenko, Vitaliy A., Farhan, Alan, Hojeij, Mohamad, Ekinci, Yasin (2012) Generation of high-resolution kagome lattice structures using extreme ultraviolet interference lithography. Applied Physics Letters, 101 (9). 93104pp. doi:10.1063/1.4748758
Bergmann, K., Danylyuk, S. V., Juschkin, L. (2009) Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm. Journal of Applied Physics, 106 (7). 73309pp. doi:10.1063/1.3243287
Switkes, M., Bloomstein, T. M., Rothschild, M. (2000) Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography. Applied Physics Letters, 77 (20). 3149-3151 doi:10.1063/1.1326490
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