Zhang, Qi, Valanoor, Nagarajan, Standard, Owen (2014) Chemical solution deposition derived (001)-oriented epitaxial BiFeO3 thin films with robust ferroelectric properties using stoichiometric precursors (invited). Journal of Applied Physics, 116 (6). 66810pp. doi:10.1063/1.4891311
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Chemical solution deposition derived (001)-oriented epitaxial BiFeO3 thin films with robust ferroelectric properties using stoichiometric precursors (invited) | ||
Journal | Journal of Applied Physics | ||
Authors | Zhang, Qi | Author | |
Valanoor, Nagarajan | Author | ||
Standard, Owen | Author | ||
Year | 2014 (August 14) | Volume | 116 |
Issue | 6 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4891311Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5200133 | Long-form Identifier | mindat:1:5:5200133:0 |
GUID | 0 | ||
Full Reference | Zhang, Qi, Valanoor, Nagarajan, Standard, Owen (2014) Chemical solution deposition derived (001)-oriented epitaxial BiFeO3 thin films with robust ferroelectric properties using stoichiometric precursors (invited). Journal of Applied Physics, 116 (6). 66810pp. doi:10.1063/1.4891311 | ||
Plain Text | Zhang, Qi, Valanoor, Nagarajan, Standard, Owen (2014) Chemical solution deposition derived (001)-oriented epitaxial BiFeO3 thin films with robust ferroelectric properties using stoichiometric precursors (invited). Journal of Applied Physics, 116 (6). 66810pp. doi:10.1063/1.4891311 | ||
In | (2014, August) Journal of Applied Physics Vol. 116 (6) AIP Publishing |
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