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Gan, Ming, Tomar, Vikas (2014) Surface stress variation as a function of applied compressive stress and temperature in microscale silicon. Journal of Applied Physics, 116 (7). 73502pp. doi:10.1063/1.4892623

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Reference TypeJournal (article/letter/editorial)
TitleSurface stress variation as a function of applied compressive stress and temperature in microscale silicon
JournalJournal of Applied Physics
AuthorsGan, MingAuthor
Tomar, VikasAuthor
Year2014 (August 21)Volume116
Issue7
PublisherAIP Publishing
DOIdoi:10.1063/1.4892623Search in ResearchGate
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Mindat Ref. ID5200238Long-form Identifiermindat:1:5:5200238:4
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Full ReferenceGan, Ming, Tomar, Vikas (2014) Surface stress variation as a function of applied compressive stress and temperature in microscale silicon. Journal of Applied Physics, 116 (7). 73502pp. doi:10.1063/1.4892623
Plain TextGan, Ming, Tomar, Vikas (2014) Surface stress variation as a function of applied compressive stress and temperature in microscale silicon. Journal of Applied Physics, 116 (7). 73502pp. doi:10.1063/1.4892623
In(2014, August) Journal of Applied Physics Vol. 116 (7) AIP Publishing

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Shi, Yang, Niu, Longfei, Gao, Yuanwen (2014) Nonlinear magnetoelectric effect in PZT/Terfenol-D nanobilayer on a substrate with surface stress. Journal of Applied Physics, 116 (2). 24101pp. doi:10.1063/1.4887435
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