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Materlik, R., Künneth, C., Kersch, A. (2015) The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model. Journal of Applied Physics, 117 (13). 134109pp. doi:10.1063/1.4916707

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Reference TypeJournal (article/letter/editorial)
TitleThe origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model
JournalJournal of Applied Physics
AuthorsMaterlik, R.Author
Künneth, C.Author
Kersch, A.Author
Year2015 (April 7)Volume117
Issue13
PublisherAIP Publishing
DOIdoi:10.1063/1.4916707Search in ResearchGate
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Mindat Ref. ID5200776Long-form Identifiermindat:1:5:5200776:9
GUID0
Full ReferenceMaterlik, R., Künneth, C., Kersch, A. (2015) The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model. Journal of Applied Physics, 117 (13). 134109pp. doi:10.1063/1.4916707
Plain TextMaterlik, R., Künneth, C., Kersch, A. (2015) The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model. Journal of Applied Physics, 117 (13). 134109pp. doi:10.1063/1.4916707
In(2015, April) Journal of Applied Physics Vol. 117 (13) AIP Publishing

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Künneth, Christopher, Materlik, Robin, Kersch, Alfred (2017) Modeling ferroelectric film properties and size effects from tetragonal interlayer in Hf1–xZrxO2 grains. Journal of Applied Physics, 121 (20). 205304pp. doi:10.1063/1.4983811
Materlik, Robin, Künneth, Christopher, Falkowski, Max, Mikolajick, Thomas, Kersch, Alfred (2018) Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study. Journal of Applied Physics, 123 (16). 164101pp. doi:10.1063/1.5021746
Materlik, Robin, Künneth, Christopher, Mikolajick, Thomas, Kersch, Alfred (2017) The impact of charge compensated and uncompensated strontium defects on the stabilization of the ferroelectric phase in HfO2. Applied Physics Letters, 111 (8). 82902pp. doi:10.1063/1.4993110
Falkowski, Max, Künneth, Christopher, Materlik, Robin, Kersch, Alfred (2018) Unexpectedly large energy variations from dopant interactions in ferroelectric HfO2 from high-throughput ab initio calculations. npj Computational Materials, 4. doi:10.1038/s41524-018-0133-4
Schroeder, Uwe, Sachdeva, Ridham, Lomenzo, Patrick D., Xu, Bohan, Materano, Monica, Mikolajick, Thomas, Kersch, Alfred (2022) Using Raman spectroscopy and x-ray diffraction for phase determination in ferroelectric mixed Hf1−xZrxO2-based layers. Journal of Applied Physics, 132 (21) 214104 doi:10.1063/5.0119871
Hoffmann, M., Schroeder, U., Schenk, T., Shimizu, T., Funakubo, H., Sakata, O., Pohl, D., Drescher, M., Adelmann, C., Materlik, R., Kersch, A., Mikolajick, T. (2015) Stabilizing the ferroelectric phase in doped hafnium oxide. Journal of Applied Physics, 118 (7). 72006pp. doi:10.1063/1.4927805
Subramanian, Gopinath, Mathew, Nithin, Leiding, Jeff (2015) A generalized force-modified potential energy surface for mechanochemical simulations. The Journal of Chemical Physics, 143 (13). 134109pp. doi:10.1063/1.4932103
Azevedo Antunes, Luis; Obernberger, Sebastian; Schwermer, Paul; Hintz, Joshua; Ganser, Richard; Schroeder, Uwe; Mikolajick, Thomas; Kersch, Alfred (2025) Kinetic Monte Carlo simulation reveals defect charge accumulation favoring ferroelectric phase formation in Hf1−xZrxO2 thin films. Journal of Applied Physics, 137 (22). doi:10.1063/5.0271703
Stolichnov, I., Cavalieri, M., Gastaldi, C., Hoffmann, M., Schroeder, U., Mikolajick, T., Ionescu, A. M. (2020) Intrinsic or nucleation-driven switching: An insight from nanoscopic analysis of negative capacitance Hf1−xZrxO2-based structures. Applied Physics Letters, 117 (17) 172902pp. doi:10.1063/5.0021272
Mehmood, Furqan, Mikolajick, Thomas, Schroeder, Uwe (2020) Lanthanum doping induced structural changes and their implications on ferroelectric properties of Hf1−xZrxO2 thin film. Applied Physics Letters, 117 (9) 92902pp. doi:10.1063/5.0021007
Athle, Robin, Persson, Anton E. O., Irish, Austin, Menon, Heera, Timm, Rainer, Borg, Mattias (2021) Effects of TiN Top Electrode Texturing on Ferroelectricity in Hf1–xZrxO2. ACS Applied Materials & Interfaces, 13 (9) 11089-11095 doi:10.1021/acsami.1c01734
 
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