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Materlik, Robin, Künneth, Christopher, Falkowski, Max, Mikolajick, Thomas, Kersch, Alfred (2018) Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study. Journal of Applied Physics, 123 (16). 164101pp. doi:10.1063/1.5021746

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Reference TypeJournal (article/letter/editorial)
TitleAl-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study
JournalJournal of Applied Physics
AuthorsMaterlik, RobinAuthor
Künneth, ChristopherAuthor
Falkowski, MaxAuthor
Mikolajick, ThomasAuthor
Kersch, AlfredAuthor
Year2018 (April 28)Volume123
Issue16
PublisherAIP Publishing
DOIdoi:10.1063/1.5021746Search in ResearchGate
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Mindat Ref. ID5208911Long-form Identifiermindat:1:5:5208911:6
GUID0
Full ReferenceMaterlik, Robin, Künneth, Christopher, Falkowski, Max, Mikolajick, Thomas, Kersch, Alfred (2018) Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study. Journal of Applied Physics, 123 (16). 164101pp. doi:10.1063/1.5021746
Plain TextMaterlik, Robin, Künneth, Christopher, Falkowski, Max, Mikolajick, Thomas, Kersch, Alfred (2018) Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study. Journal of Applied Physics, 123 (16). 164101pp. doi:10.1063/1.5021746
In(2018, April) Journal of Applied Physics Vol. 123 (16) AIP Publishing

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Materlik, Robin, Künneth, Christopher, Mikolajick, Thomas, Kersch, Alfred (2017) The impact of charge compensated and uncompensated strontium defects on the stabilization of the ferroelectric phase in HfO2. Applied Physics Letters, 111 (8). 82902pp. doi:10.1063/1.4993110
Falkowski, Max, Künneth, Christopher, Materlik, Robin, Kersch, Alfred (2018) Unexpectedly large energy variations from dopant interactions in ferroelectric HfO2 from high-throughput ab initio calculations. npj Computational Materials, 4. doi:10.1038/s41524-018-0133-4
Künneth, Christopher, Materlik, Robin, Kersch, Alfred (2017) Modeling ferroelectric film properties and size effects from tetragonal interlayer in Hf1–xZrxO2 grains. Journal of Applied Physics, 121 (20). 205304pp. doi:10.1063/1.4983811
Künneth, Christopher, Kölbl, Simon, Wagner, Hans Edwin, Häublein, Volker, Kersch, Alfred, Alt, Hans Christian (2018) Symmetry and structure of carbon-nitrogen complexes in gallium arsenide from infrared spectroscopy and first-principles calculations. Journal of Applied Physics, 123 (16). 161553pp. doi:10.1063/1.5006429
Azevedo Antunes, Luis, Ganser, Richard, Alcala, Ruben, Mikolajick, Thomas, Schroeder, Uwe, Kersch, Alfred (2021) An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism. Applied Physics Letters, 119 (8) 82903pp. doi:10.1063/5.0063808
Materlik, R., Künneth, C., Kersch, A. (2015) The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model. Journal of Applied Physics, 117 (13). 134109pp. doi:10.1063/1.4916707
Falkowski, Max, Kersch, Alfred (2021) Ab initio interphase characteristics in HfO2 and ZrO2 and nucleation of the polar phase. Applied Physics Letters, 118 (3) 32905pp. doi:10.1063/5.0029610
Kovac, Nicola, Künneth, Christopher, Alt, Hans Christian (2018) Piezospectroscopy and first-principles calculations of the nitrogen-vacancy center in gallium arsenide. Journal of Applied Physics, 123 (16). 161583pp. doi:10.1063/1.5011302
Mittmann, Terence, Michailow, Michail, Lomenzo, Patrick D., Gärtner, Jan, Falkowski, Max, Kersch, Alfred, Mikolajick, Thomas, Schroeder, Uwe (2021) Stabilizing the ferroelectric phase in HfO2-based films sputtered from ceramic targets under ambient oxygen. Nanoscale, 13 (2) 912-921 doi:10.1039/d0nr07699f
Max, Benjamin, Pešić, Milan, Slesazeck, Stefan, Mikolajick, Thomas (2018) Interplay between ferroelectric and resistive switching in doped crystalline HfO2. Journal of Applied Physics, 123 (13). 134102pp. doi:10.1063/1.5015985
Azevedo Antunes, Luis; Obernberger, Sebastian; Schwermer, Paul; Hintz, Joshua; Ganser, Richard; Schroeder, Uwe; Mikolajick, Thomas; Kersch, Alfred (2025) Kinetic Monte Carlo simulation reveals defect charge accumulation favoring ferroelectric phase formation in Hf1−xZrxO2 thin films. Journal of Applied Physics, 137 (22). doi:10.1063/5.0271703
 
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