Reference Type | Journal (article/letter/editorial) |
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Title | Early stages of plasma induced nitridation of Si (111) surface and study of interfacial band alignment |
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Journal | Journal of Applied Physics |
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Authors | Shetty, Satish | Author |
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Shivaprasad, S. M. | Author |
Year | 2016 (February 7) | Volume | 119 |
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Issue | 5 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.4941102Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5204838 | Long-form Identifier | mindat:1:5:5204838:6 |
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GUID | 0 |
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Full Reference | Shetty, Satish, Shivaprasad, S. M. (2016) Early stages of plasma induced nitridation of Si (111) surface and study of interfacial band alignment. Journal of Applied Physics, 119 (5). 55306pp. doi:10.1063/1.4941102 |
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Plain Text | Shetty, Satish, Shivaprasad, S. M. (2016) Early stages of plasma induced nitridation of Si (111) surface and study of interfacial band alignment. Journal of Applied Physics, 119 (5). 55306pp. doi:10.1063/1.4941102 |
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In | (2016, February) Journal of Applied Physics Vol. 119 (5) AIP Publishing |
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