Xu, Hao, Yang, Hong, Wang, Yan-Rong, Wang, Wen-Wu, Luo, Wei-Chun, Qi, Lu-Wei, Li, Jun-Feng, Zhao, Chao, Chen, Da-Peng, Ye, Tian-Chun (2016) Temperature- and voltage-dependent trap generation model in high- k metal gate MOS device with percolation simulation. Chinese Physics B, 25. 87306pp. doi:10.1088/1674-1056/25/8/087306
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Temperature- and voltage-dependent trap generation model in high- k metal gate MOS device with percolation simulation | ||
Journal | Chinese Physics B | ||
Authors | Xu, Hao | Author | |
Yang, Hong | Author | ||
Wang, Yan-Rong | Author | ||
Wang, Wen-Wu | Author | ||
Luo, Wei-Chun | Author | ||
Qi, Lu-Wei | Author | ||
Li, Jun-Feng | Author | ||
Zhao, Chao | Author | ||
Chen, Da-Peng | Author | ||
Ye, Tian-Chun | Author | ||
Year | 2016 (August) | Volume | 25 |
Publisher | IOP Publishing | ||
DOI | doi:10.1088/1674-1056/25/8/087306Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 6007583 | Long-form Identifier | mindat:1:5:6007583:5 |
GUID | 0 | ||
Full Reference | Xu, Hao, Yang, Hong, Wang, Yan-Rong, Wang, Wen-Wu, Luo, Wei-Chun, Qi, Lu-Wei, Li, Jun-Feng, Zhao, Chao, Chen, Da-Peng, Ye, Tian-Chun (2016) Temperature- and voltage-dependent trap generation model in high- k metal gate MOS device with percolation simulation. Chinese Physics B, 25. 87306pp. doi:10.1088/1674-1056/25/8/087306 | ||
Plain Text | Xu, Hao, Yang, Hong, Wang, Yan-Rong, Wang, Wen-Wu, Luo, Wei-Chun, Qi, Lu-Wei, Li, Jun-Feng, Zhao, Chao, Chen, Da-Peng, Ye, Tian-Chun (2016) Temperature- and voltage-dependent trap generation model in high- k metal gate MOS device with percolation simulation. Chinese Physics B, 25. 87306pp. doi:10.1088/1674-1056/25/8/087306 | ||
In | (n.d.) Chinese Physics B Vol. 25. IOP Publishing |
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