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Rublack, T., Hartnauer, S., Kappe, P., Swiatkowski, C., Seifert, G. (2011) Selective ablation of thin SiO2 layers on silicon substrates by femto- and picosecond laser pulses. Applied Physics A, 103. 43-50 doi:10.1007/s00339-011-6352-x

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Reference TypeJournal (article/letter/editorial)
TitleSelective ablation of thin SiO2 layers on silicon substrates by femto- and picosecond laser pulses
JournalApplied Physics A
AuthorsRublack, T.Author
Hartnauer, S.Author
Kappe, P.Author
Swiatkowski, C.Author
Seifert, G.Author
Year2011 (April)Volume103
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00339-011-6352-xSearch in ResearchGate
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Mindat Ref. ID6015004Long-form Identifiermindat:1:5:6015004:8
GUID0
Full ReferenceRublack, T., Hartnauer, S., Kappe, P., Swiatkowski, C., Seifert, G. (2011) Selective ablation of thin SiO2 layers on silicon substrates by femto- and picosecond laser pulses. Applied Physics A, 103. 43-50 doi:10.1007/s00339-011-6352-x
Plain TextRublack, T., Hartnauer, S., Kappe, P., Swiatkowski, C., Seifert, G. (2011) Selective ablation of thin SiO2 layers on silicon substrates by femto- and picosecond laser pulses. Applied Physics A, 103. 43-50 doi:10.1007/s00339-011-6352-x
In(2011) Applied Physics A Vol. 103. Springer Science and Business Media LLC

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Hermann, Sonja, Harder, Nils-Peter, Brendel, Rolf, Herzog, Dirk, Haferkamp, Heinz (2010) Picosecond laser ablation of SiO2 layers on silicon substrates. Applied Physics A, 99. 151-158 doi:10.1007/s00339-009-5464-z
Metzner, D., Lickschat, P., Weißmantel, S. (2019) Laser micromachining of silicon and cemented tungsten carbide using picosecond laser pulses in burst mode: ablation mechanisms and heat accumulation. Applied Physics A, 125. doi:10.1007/s00339-019-2755-x
Rublack, Tino, Schade, Martin, Muchow, Markus, Leipner, Hartmut S., Seifert, Gerhard (2012) Proof of damage-free selective removal of thin dielectric coatings on silicon wafers by irradiation with femtosecond laser pulses. Journal of Applied Physics, 112 (2). 23521pp. doi:10.1063/1.4739305
Choi, Junha, Cho, Sung-Hak (2024) Ablation morphology and defect analysis of Ti thin film irradiated by femto- and picosecond laser for fine ablation of Micro-LED display thin film transistor repair. Applied Physics A, 130 (8) doi:10.1007/s00339-024-07714-1
Wiesner, Markus, Ihlemann, Jürgen (2011) High resolution patterning of sapphire by F2-laser ablation. Applied Physics A, 103. 51-58 doi:10.1007/s00339-011-6347-7
Yung, K. C., Cai, Zhixiang, Choy, H. S. (2012) Selective patterning and scribing of Ti thin film on glass substrate by 532 nm picosecond laser. Applied Physics A, 107. 351-355 doi:10.1007/s00339-012-6813-x
Frank, P., Shaw-Stewart, J., Lippert, T., Boneberg, J., Leiderer, P. (2011) Laser-induced ablation dynamics and flight of thin polymer films. Applied Physics A, 104. 579-582 doi:10.1007/s00339-011-6500-3
Zoppel, S., Huber, H., Reider, G.A. (2007) Selective ablation of thin Mo and TCO films with femtosecond laser pulses for structuring thin film solar cells. Applied Physics A, 89. 161-163 doi:10.1007/s00339-007-4158-7
Richter, S., Döring, S., Tünnermann, A., Nolte, S. (2011) Bonding of glass with femtosecond laser pulses at high repetition rates. Applied Physics A, 103. 257-261 doi:10.1007/s00339-011-6369-1
Schwertfeger, S., Klehr, A., Hoffmann, T., Liero, A., Wenzel, H., Erbert, G. (2011) Picosecond pulses with 50 W peak power and reduced ASE background from an all-semiconductor MOPA system. Applied Physics B, 103 (3). 603-607 doi:10.1007/s00340-011-4481-8
Brand, A. A., Meyer, F., Nekarda, J.-F., Preu, R. (2014) Reduction of picosecond laser ablation threshold and damage via nanosecond pre-pulse for removal of dielectric layers on silicon solar cells. Applied Physics A, 117. 237-241 doi:10.1007/s00339-014-8444-x
 
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