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Mitchell, D. F., Arlow, J. S., Phillips, J. R., Sproule, G. I. (1989) Optimized ion beam raster for SIMS sputter depth profiling. Surface and Interface Analysis, 14 (6). 302-306 doi:10.1002/sia.740140606

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Reference TypeJournal (article/letter/editorial)
TitleOptimized ion beam raster for SIMS sputter depth profiling
JournalSurface and Interface Analysis
AuthorsMitchell, D. F.Author
Arlow, J. S.Author
Phillips, J. R.Author
Sproule, G. I.Author
Year1989 (June)Volume14
Issue6
PublisherWiley
DOIdoi:10.1002/sia.740140606Search in ResearchGate
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Mindat Ref. ID6502223Long-form Identifiermindat:1:5:6502223:6
GUID0
Full ReferenceMitchell, D. F., Arlow, J. S., Phillips, J. R., Sproule, G. I. (1989) Optimized ion beam raster for SIMS sputter depth profiling. Surface and Interface Analysis, 14 (6). 302-306 doi:10.1002/sia.740140606
Plain TextMitchell, D. F., Arlow, J. S., Phillips, J. R., Sproule, G. I. (1989) Optimized ion beam raster for SIMS sputter depth profiling. Surface and Interface Analysis, 14 (6). 302-306 doi:10.1002/sia.740140606
In(1989, June) Surface and Interface Analysis Vol. 14 (6) Wiley

See Also

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Mitchell, D. F., Sproule, G. I., Graham, M. J. (1990) Sputter reduction of oxides by ion bombardment during Auger depth profile analysis. Surface and Interface Analysis, 15 (8). 487-497 doi:10.1002/sia.740150808
Duncan, S., Smith, R., Sykes, D. E., Walls, J. M. (1983) Sputter-depth profiling in AES: Dependence of depth resolution on electron and ion beam geometry. Surface and Interface Analysis, 5 (2). 71-76 doi:10.1002/sia.740050204
Carter, G., Katardjiev, I. V., Nobes, M. J. (1989) An altered layer model for sputter-profiling. Surface and Interface Analysis, 14 (4). 194-208 doi:10.1002/sia.740140406
(1989) American society for testing and materials standard practice for reporting sputter depth profile data in secondary ion mass spectrometry (SIMS) (e1162-87). Surface and Interface Analysis, 14 (6). 421-422 doi:10.1002/sia.740140622
Franzreb, K., Mathieu, H. J., Landolt, D. (1995) Reactive ion sputter depth profiling of tantalum oxides: A comparative study using ToF-SIMS and laser-SNMS. Surface and Interface Analysis, 23 (9). 641-651 doi:10.1002/sia.740230910
Hinder, Steven J., Lowe, Chris, Watts, John F. (2007) ToF-SIMS depth profiling of a complex polymeric coating employing a C60 sputter source. Surface and Interface Analysis, 39 (6). 467-475 doi:10.1002/sia.2546
Zalm, P. C., Janssen, K. T. F., Fontijn, G. M., Vriezema, C. J. (1989) Post-implantation as an aid in scale calibration for SIMS depth profiling. Surface and Interface Analysis, 14 (11). 781-786 doi:10.1002/sia.740141115
Skinner, D. K. (1989) The application of ion beam bevel sectioning and post-sputter etch treatment in Auger crater-edge profiling. Surface and Interface Analysis, 14 (9). 567-571 doi:10.1002/sia.740140913
Kim, K. J., Moon, D. W., Nam, S. H., Lee, W. J., Kim, H. G. (1995) XPS sputter depth profiling of the chemical states for SrTiO3/Si interface by O2+ ion beams. Surface and Interface Analysis, 23 (13). 851-857 doi:10.1002/sia.740231302
Kilner, A. M. C., Kilner, J. A., Elliott, J. C., Cressey, G., Littlewood, S. D. (1991) The effect of orientation on ion beam erosion rates in ionic crystals measured by SIMS depth profiling. Surface and Interface Analysis, 17 (3). 158-164 doi:10.1002/sia.740170307
Rading, D., Moellers, R., Kollmer, F., Paul, W., Niehuis, E. (2011) Dual beam depth profiling of organic materials: Variations of analysis and sputter beam conditions. Surface and Interface Analysis, 43 (1). 198-200 doi:10.1002/sia.3422
 
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