Reference Type | Journal (article/letter/editorial) |
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Title | Hydrogen Implantation Effects on the Electrical and Optical Properties of Metal Nitride Thin Films |
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Journal | MATERIALS TRANSACTIONS |
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Authors | Ishikawa, Tsutomu | Author |
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Masuda, Masataka | Author |
Hayashi, Yasunori | Author |
Year | 2002 | Volume | 43 |
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Issue | 5 |
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Publisher | Japan Institute of Metals |
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DOI | doi:10.2320/matertrans.43.1138Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 7776454 | Long-form Identifier | mindat:1:5:7776454:8 |
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GUID | 0 |
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Full Reference | Ishikawa, Tsutomu, Masuda, Masataka, Hayashi, Yasunori (2002) Hydrogen Implantation Effects on the Electrical and Optical Properties of Metal Nitride Thin Films. MATERIALS TRANSACTIONS, 43 (5). 1138-1141 doi:10.2320/matertrans.43.1138 |
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Plain Text | Ishikawa, Tsutomu, Masuda, Masataka, Hayashi, Yasunori (2002) Hydrogen Implantation Effects on the Electrical and Optical Properties of Metal Nitride Thin Films. MATERIALS TRANSACTIONS, 43 (5). 1138-1141 doi:10.2320/matertrans.43.1138 |
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In | (2002) MATERIALS TRANSACTIONS Vol. 43 (5) Japan Institute of Metals |
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