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Kirss, Rein U., Meda, Lamartine (1998) Chemical vapor deposition of tungsten oxide. Applied Organometallic Chemistry, 12 (3). 155-160 doi:10.1002/(sici)1099-0739(199803)12:3<155::aid-aoc688>3.0.co;2-z

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Reference TypeJournal (article/letter/editorial)
TitleChemical vapor deposition of tungsten oxide
JournalApplied Organometallic Chemistry
AuthorsKirss, Rein U.Author
Meda, LamartineAuthor
Year1998 (March)Volume12
Issue3
PublisherWiley
DOIdoi:10.1002/(sici)1099-0739(199803)12:3<155::aid-aoc688>3.0.co;2-zSearch in ResearchGate
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Mindat Ref. ID7841212Long-form Identifiermindat:1:5:7841212:9
GUID0
Full ReferenceKirss, Rein U., Meda, Lamartine (1998) Chemical vapor deposition of tungsten oxide. Applied Organometallic Chemistry, 12 (3). 155-160 doi:10.1002/(sici)1099-0739(199803)12:3<155::aid-aoc688>3.0.co;2-z
Plain TextKirss, Rein U., Meda, Lamartine (1998) Chemical vapor deposition of tungsten oxide. Applied Organometallic Chemistry, 12 (3). 155-160 doi:10.1002/(sici)1099-0739(199803)12:33.0.co;2-z
In(1998, March) Applied Organometallic Chemistry Vol. 12 (3) Wiley

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