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Hubert-Pfalzgraf, Liliane G., Guillon, Herv� (1998) Trends in precursor design for conventional and aerosol-assisted CVD of high-Tc superconductors. Applied Organometallic Chemistry, 12 (3). 221-236 doi:10.1002/(sici)1099-0739(199803)12:3<221::aid-aoc693>3.0.co;2-o

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Reference TypeJournal (article/letter/editorial)
TitleTrends in precursor design for conventional and aerosol-assisted CVD of high-Tc superconductors
JournalApplied Organometallic Chemistry
AuthorsHubert-Pfalzgraf, Liliane G.Author
Guillon, Herv�Author
Year1998 (March)Volume12
Issue3
PublisherWiley
DOIdoi:10.1002/(sici)1099-0739(199803)12:3<221::aid-aoc693>3.0.co;2-oSearch in ResearchGate
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Mindat Ref. ID7841217Long-form Identifiermindat:1:5:7841217:4
GUID0
Full ReferenceHubert-Pfalzgraf, Liliane G., Guillon, Herv� (1998) Trends in precursor design for conventional and aerosol-assisted CVD of high-Tc superconductors. Applied Organometallic Chemistry, 12 (3). 221-236 doi:10.1002/(sici)1099-0739(199803)12:3<221::aid-aoc693>3.0.co;2-o
Plain TextHubert-Pfalzgraf, Liliane G., Guillon, Herv� (1998) Trends in precursor design for conventional and aerosol-assisted CVD of high-Tc superconductors. Applied Organometallic Chemistry, 12 (3). 221-236 doi:10.1002/(sici)1099-0739(199803)12:33.0.co;2-o
In(1998, March) Applied Organometallic Chemistry Vol. 12 (3) Wiley

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Hossenlopp, Jeanne M., Lamelas, F. J., Middleton, Kenneth, Rzepiela, Jeffrey A., Schmidt, Jason D., Zivkovic, Aleksandar (1998) Comparison of SnBr4 and di-n-butyl tin diacetate as laser-assisted chemical vapor deposition precursors for SnO2-based gas sensors. Applied Organometallic Chemistry, 12 (3). 147-154 doi:10.1002/(sici)1099-0739(199803)12:3<147::aid-aoc687>3.0.co;2-x
B�nnemann, Helmut (1998) Preface. Applied Organometallic Chemistry, 12 (5). 303 doi:10.1002/(sici)1099-0739(199805)12:5<303::aid-aoc742>3.0.co;2-e
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Maguire, R. James (1998) Yiu Kee Chau: An appreciation. Applied Organometallic Chemistry, 12 (8). 523-529 doi:10.1002/(sici)1099-0739(199808/09)12:8/9<523::aid-aoc757>3.0.co;2-g
(1999) Erratum. Applied Organometallic Chemistry, 13 (12). 893 doi:10.1002/(sici)1099-0739(199912)13:12<893::aid-aoc972>3.0.co;2-#
 
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