Xu, Wenting, Tu, Hailing, Chang, Qing, Xiao, Qinghua (2011) Stress relaxation of Si/Si1−x Ge x /Si structure prepared by ion implantation and subsequent annealing process. Rare Metals, 30. 270-273 doi:10.1007/s12598-011-0381-7
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Stress relaxation of Si/Si1−x Ge x /Si structure prepared by ion implantation and subsequent annealing process | ||
Journal | Rare Metals | ||
Authors | Xu, Wenting | Author | |
Tu, Hailing | Author | ||
Chang, Qing | Author | ||
Xiao, Qinghua | Author | ||
Year | 2011 (June) | Volume | 30 |
Publisher | Springer Science and Business Media LLC | ||
DOI | doi:10.1007/s12598-011-0381-7Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8049105 | Long-form Identifier | mindat:1:5:8049105:9 |
GUID | 0 | ||
Full Reference | Xu, Wenting, Tu, Hailing, Chang, Qing, Xiao, Qinghua (2011) Stress relaxation of Si/Si1−x Ge x /Si structure prepared by ion implantation and subsequent annealing process. Rare Metals, 30. 270-273 doi:10.1007/s12598-011-0381-7 | ||
Plain Text | Xu, Wenting, Tu, Hailing, Chang, Qing, Xiao, Qinghua (2011) Stress relaxation of Si/Si1−x Ge x /Si structure prepared by ion implantation and subsequent annealing process. Rare Metals, 30. 270-273 doi:10.1007/s12598-011-0381-7 | ||
In | (2011) Rare Metals Vol. 30. Springer Science and Business Media LLC |
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