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Teng, Ran, Zhou, Qigang, Dai, Xiaolin, Wu, Zhiqiang, Xu, Wenting, Xiao, Qinghua, Wu, Xiao, Guo, Xi (2012) Optimization of heat shield for single silicon crystal growth by using numerical simulation. Rare Metals, 31. 489-493 doi:10.1007/s12598-012-0545-0

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Reference TypeJournal (article/letter/editorial)
TitleOptimization of heat shield for single silicon crystal growth by using numerical simulation
JournalRare Metals
AuthorsTeng, RanAuthor
Zhou, QigangAuthor
Dai, XiaolinAuthor
Wu, ZhiqiangAuthor
Xu, WentingAuthor
Xiao, QinghuaAuthor
Wu, XiaoAuthor
Guo, XiAuthor
Year2012 (October)Volume31
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s12598-012-0545-0Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8049420Long-form Identifiermindat:1:5:8049420:5
GUID0
Full ReferenceTeng, Ran, Zhou, Qigang, Dai, Xiaolin, Wu, Zhiqiang, Xu, Wenting, Xiao, Qinghua, Wu, Xiao, Guo, Xi (2012) Optimization of heat shield for single silicon crystal growth by using numerical simulation. Rare Metals, 31. 489-493 doi:10.1007/s12598-012-0545-0
Plain TextTeng, Ran, Zhou, Qigang, Dai, Xiaolin, Wu, Zhiqiang, Xu, Wenting, Xiao, Qinghua, Wu, Xiao, Guo, Xi (2012) Optimization of heat shield for single silicon crystal growth by using numerical simulation. Rare Metals, 31. 489-493 doi:10.1007/s12598-012-0545-0
In(2012) Rare Metals Vol. 31. Springer Science and Business Media LLC

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YU, G, HAILING, T, QIGANG, Z, XIAOLIN, D, QINGHUA, X (2007) Comparison of measurements and simulation results in 300 mm CZ silicon crystal growth. Rare Metals, 26. 607-610 doi:10.1016/s1001-0521(08)60014-5
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