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Nouhi, A., Radhakrishnan, G., Katz, J., Koliwad, K. (1988) Molecular beam epitaxy and metalorganic chemical vapor deposition growth of epitaxial CdTe on (100) GaAs/Si and (111) GaAs/Si substrates. Applied Physics Letters, 52 (24). 2028-2030 doi:10.1063/1.99571

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Reference TypeJournal (article/letter/editorial)
TitleMolecular beam epitaxy and metalorganic chemical vapor deposition growth of epitaxial CdTe on (100) GaAs/Si and (111) GaAs/Si substrates
JournalApplied Physics Letters
AuthorsNouhi, A.Author
Radhakrishnan, G.Author
Katz, J.Author
Koliwad, K.Author
Year1988 (June 13)Volume52
Issue24
PublisherAIP Publishing
DOIdoi:10.1063/1.99571Search in ResearchGate
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Mindat Ref. ID8483344Long-form Identifiermindat:1:5:8483344:8
GUID0
Full ReferenceNouhi, A., Radhakrishnan, G., Katz, J., Koliwad, K. (1988) Molecular beam epitaxy and metalorganic chemical vapor deposition growth of epitaxial CdTe on (100) GaAs/Si and (111) GaAs/Si substrates. Applied Physics Letters, 52 (24). 2028-2030 doi:10.1063/1.99571
Plain TextNouhi, A., Radhakrishnan, G., Katz, J., Koliwad, K. (1988) Molecular beam epitaxy and metalorganic chemical vapor deposition growth of epitaxial CdTe on (100) GaAs/Si and (111) GaAs/Si substrates. Applied Physics Letters, 52 (24). 2028-2030 doi:10.1063/1.99571
In(1988, June) Applied Physics Letters Vol. 52 (24) AIP Publishing


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