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Ritsko, J. J., Ho, F., Hurst, J. (1988) Laser‐assisted chemical etching of copper. Applied Physics Letters, 53 (1). 78-80 doi:10.1063/1.100128

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Reference TypeJournal (article/letter/editorial)
TitleLaser‐assisted chemical etching of copper
JournalApplied Physics Letters
AuthorsRitsko, J. J.Author
Ho, F.Author
Hurst, J.Author
Year1988 (July 4)Volume53
Issue1
PublisherAIP Publishing
DOIdoi:10.1063/1.100128Search in ResearchGate
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Mindat Ref. ID8483979Long-form Identifiermindat:1:5:8483979:8
GUID0
Full ReferenceRitsko, J. J., Ho, F., Hurst, J. (1988) Laser‐assisted chemical etching of copper. Applied Physics Letters, 53 (1). 78-80 doi:10.1063/1.100128
Plain TextRitsko, J. J., Ho, F., Hurst, J. (1988) Laser‐assisted chemical etching of copper. Applied Physics Letters, 53 (1). 78-80 doi:10.1063/1.100128
In(1988, July) Applied Physics Letters Vol. 53 (1) AIP Publishing

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Koren, G., Ho, F., Ritsko, J. J. (1985) Excimer laser etching of Al metal films in chlorine environments. Applied Physics Letters, 46 (10). 1006-1008 doi:10.1063/1.95815
Bienstock, Rachelle J. (1989) Laser‐assisted photochemical etching of Hg0.8Cd0.2Te. Applied Physics Letters, 54 (1). 54-56 doi:10.1063/1.100833
Cooke, M. J., Pelletier, J. (1988) Self‐biasing effects on plasma etching characteristics of Si and SiO2. Applied Physics Letters, 53 (1). 19-21 doi:10.1063/1.100567
Lim, P., Brock, J., Trachtenberg, I. (1993) Laser‐assisted liquid film etching. Applied Physics Letters, 62 (25). 3345-3347 doi:10.1063/1.109066
Pelletier, J. (1988) Comment on ‘‘Low‐temperature reactive ion etching and microwave plasma etching of silicon’’ [Appl. Phys. Lett. 52, 616 (1988)]. Applied Physics Letters, 53 (17). 1665-1666 doi:10.1063/1.99792
Stirland, D. J. (1988) Quantitative defect etching of GaAs on Si: Is it possible?. Applied Physics Letters, 53 (24). 2432-2434 doi:10.1063/1.100211
Epler, J. E., Thornton, R. L., Mosby, W. J., Paoli, T. L. (1988) Low threshold buried‐heterostructure quantum well lasers by excimer laser assisted disordering. Applied Physics Letters, 53 (16). 1459-1461 doi:10.1063/1.99966
Cole, H. S., Liu, Y. S., Rose, J. W., Guida, R. (1988) Laser‐induced selective copper deposition on polyimide. Applied Physics Letters, 53 (21). 2111-2113 doi:10.1063/1.100292
Pelletier, J., Arnal, Y., Joubert, O. (1988) Etching mechanisms of polymers in oxygen microwave multipolar plasmas. Applied Physics Letters, 53 (20). 1914-1916 doi:10.1063/1.100343
Fracassi, F., Coburn, J. W. (1988) Plasma‐assisted etching of tungsten films: A quartz‐crystal microbalance study. Journal of Applied Physics, 63 (5). 1758-1761 doi:10.1063/1.339915
Ghosh, A. P., Hurst, J. E. (1988) Photoacoustic studies of excimer laser induced ablation of polymethylmethacrylate. Journal of Applied Physics, 64 (1). 287-290 doi:10.1063/1.341424
 
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