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Davis, G. M., Gower, M. C., O’Neill, F., Turcu, I. C. E. (1988) Plasma x‐ray source for lithography generated by a ≊30 J, 30 ns KrF laser. Applied Physics Letters, 53 (17). 1583-1585 doi:10.1063/1.99919

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Reference TypeJournal (article/letter/editorial)
TitlePlasma x‐ray source for lithography generated by a ≊30 J, 30 ns KrF laser
JournalApplied Physics Letters
AuthorsDavis, G. M.Author
Gower, M. C.Author
O’Neill, F.Author
Turcu, I. C. E.Author
Year1988 (October 24)Volume53
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.99919Search in ResearchGate
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Mindat Ref. ID8484532Long-form Identifiermindat:1:5:8484532:8
GUID0
Full ReferenceDavis, G. M., Gower, M. C., O’Neill, F., Turcu, I. C. E. (1988) Plasma x‐ray source for lithography generated by a ≊30 J, 30 ns KrF laser. Applied Physics Letters, 53 (17). 1583-1585 doi:10.1063/1.99919
Plain TextDavis, G. M., Gower, M. C., O’Neill, F., Turcu, I. C. E. (1988) Plasma x‐ray source for lithography generated by a ≊30 J, 30 ns KrF laser. Applied Physics Letters, 53 (17). 1583-1585 doi:10.1063/1.99919
In(1988, October) Applied Physics Letters Vol. 53 (17) AIP Publishing

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O'Neill, F., Gower, M. C., Turcu, I. C. E., Owadano, Y. (1986) X-ray lithography using a KrF laser–plasma source. Applied Optics, 25. 464pp. doi:10.1364/ao.25.000464
O’Neill, F., Turcu, I. C. E., Xenakis, D., Hutchinson, M. H. R. (1989) X‐ray emission from plasmas generated by an XeCl laser picosecond pulse train. Applied Physics Letters, 55 (25). 2603-2604 doi:10.1063/1.101992
Turcu, I. C. E., Ross, I. N., Tallents, G. J. (1993) Efficient keV x‐ray emission from plasmas generated with 4 ps KrF excimer laser pulses. Applied Physics Letters, 63 (22). 3046-3048 doi:10.1063/1.110253
Matsumoto, Y., Shaw, M. J., O’Neill, F., Partanen, J. P., Key, M. H., Eason, R., Ross, I. N., Hodgson, E. M., Sakagami, Y. (1985) X‐ray emission from KrF laser‐produced Al plasmas. Applied Physics Letters, 46 (1). 28-30 doi:10.1063/1.95838
Xenakis, D., Hutchinson, M. H. R., O’Neill, F., Turcu, I. C. E. (1992) Laser‐plasma x‐ray generation using an injection‐mode‐locked XeCl excimer laser. Journal of Applied Physics, 71 (1). 85-93 doi:10.1063/1.350652
Turcu, I. C. E., Ross, I. N., Schulz, M. S., Daido, H., Tallents, G. J., Krishnan, J., Dwivedi, L., Hening, A. (1993) Spatial coherence measurements and x‐ray holographic imaging using a laser‐generated plasma x‐ray source in the water window spectral region. Journal of Applied Physics, 73 (12). 8081-8087 doi:10.1063/1.353924
Morsell, A. L., Powers, M., Shields, H. (1992) Plasma soft x‐ray source generated by 4‐ns excimer laser pulses. Applied Physics Letters, 60 (4). 425-427 doi:10.1063/1.106623
Daido, H., Turcu, I. C. E., Ross, I. N., Watson, J. G., Steyer, M., Kaur, R., Schulz, M. S., Amit, M. (1992) Spatial coherence of a repetitive laser‐plasma point x‐ray source in the water window spectral region. Applied Physics Letters, 60 (10). 1155-1157 doi:10.1063/1.107389
Michette, A. G., Turcu, I. C. E., Schulz, M. S., Browne, M. T., Morrison, G. R., Fluck, P., Buckley, C. J., Foster, G. F. (1993) Scanning x‐ray microscopy using a laser‐plasma source. Review of Scientific Instruments, 64 (6). 1478-1482 doi:10.1063/1.1144067
Turcu, I. C. E., Ross, I. N. (1996) 1 W plasma x‐ray source for lithography at 1 nm wavelength. Review of Scientific Instruments, 67 (9). 3245-3247 doi:10.1063/1.1147404
Michette, A G, Rogoyski, A M, Burge, R E (1988) A laser-generated plasma source for x-ray lithography and VLSI. Journal of Physics E: Scientific Instruments, 21 (10). 959-965 doi:10.1088/0022-3735/21/10/011
 
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