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Li, Yu‐Lin, Zhang, Zhuang‐Jian, Zheng, Qi‐Ke, Jin, Zhong‐Kao, Wu, Zhen‐Kai, Qin, Qi‐Zong (1988) Molecular beam study of laser‐induced chemical etching of Si(111) by chlorine molecules. Applied Physics Letters, 53 (20). 1955-1957 doi:10.1063/1.100334

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Reference TypeJournal (article/letter/editorial)
TitleMolecular beam study of laser‐induced chemical etching of Si(111) by chlorine molecules
JournalApplied Physics Letters
AuthorsLi, Yu‐LinAuthor
Zhang, Zhuang‐JianAuthor
Zheng, Qi‐KeAuthor
Jin, Zhong‐KaoAuthor
Wu, Zhen‐KaiAuthor
Qin, Qi‐ZongAuthor
Year1988 (November 14)Volume53
Issue20
PublisherAIP Publishing
DOIdoi:10.1063/1.100334Search in ResearchGate
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Mindat Ref. ID8484800Long-form Identifiermindat:1:5:8484800:6
GUID0
Full ReferenceLi, Yu‐Lin, Zhang, Zhuang‐Jian, Zheng, Qi‐Ke, Jin, Zhong‐Kao, Wu, Zhen‐Kai, Qin, Qi‐Zong (1988) Molecular beam study of laser‐induced chemical etching of Si(111) by chlorine molecules. Applied Physics Letters, 53 (20). 1955-1957 doi:10.1063/1.100334
Plain TextLi, Yu‐Lin, Zhang, Zhuang‐Jian, Zheng, Qi‐Ke, Jin, Zhong‐Kao, Wu, Zhen‐Kai, Qin, Qi‐Zong (1988) Molecular beam study of laser‐induced chemical etching of Si(111) by chlorine molecules. Applied Physics Letters, 53 (20). 1955-1957 doi:10.1063/1.100334
In(1988, November) Applied Physics Letters Vol. 53 (20) AIP Publishing

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