Watch the Dallas Symposium LIVE, and fundraiser auction
Ticket proceeds support mindat.org! - click here...
Log InRegister
Quick Links : The Mindat ManualThe Rock H. Currier Digital LibraryMindat Newsletter [Free Download]
Home PageAbout MindatThe Mindat ManualHistory of MindatCopyright StatusWho We AreContact UsAdvertise on Mindat
Donate to MindatCorporate SponsorshipSponsor a PageSponsored PagesMindat AdvertisersAdvertise on Mindat
Learning CenterWhat is a mineral?The most common minerals on earthInformation for EducatorsMindat ArticlesThe ElementsThe Rock H. Currier Digital LibraryGeologic Time
Minerals by PropertiesMinerals by ChemistryAdvanced Locality SearchRandom MineralRandom LocalitySearch by minIDLocalities Near MeSearch ArticlesSearch GlossaryMore Search Options
Search For:
Mineral Name:
Locality Name:
Keyword(s):
 
The Mindat ManualAdd a New PhotoRate PhotosLocality Edit ReportCoordinate Completion ReportAdd Glossary Item
Mining CompaniesStatisticsUsersMineral MuseumsClubs & OrganizationsMineral Shows & EventsThe Mindat DirectoryDevice SettingsThe Mineral Quiz
Photo SearchPhoto GalleriesSearch by ColorNew Photos TodayNew Photos YesterdayMembers' Photo GalleriesPast Photo of the Day GalleryPhotography

Johnson, N. M., Walker, J., Doland, C. M., Winer, K., Street, R. A. (1989) Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma. Applied Physics Letters, 54 (19). 1872-1874 doi:10.1063/1.101264

Advanced
   -   Only viewable:
Reference TypeJournal (article/letter/editorial)
TitleHydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma
JournalApplied Physics Letters
AuthorsJohnson, N. M.Author
Walker, J.Author
Doland, C. M.Author
Winer, K.Author
Street, R. A.Author
Year1989 (May 8)Volume54
Issue19
PublisherAIP Publishing
DOIdoi:10.1063/1.101264Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8486556Long-form Identifiermindat:1:5:8486556:2
GUID0
Full ReferenceJohnson, N. M., Walker, J., Doland, C. M., Winer, K., Street, R. A. (1989) Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma. Applied Physics Letters, 54 (19). 1872-1874 doi:10.1063/1.101264
Plain TextJohnson, N. M., Walker, J., Doland, C. M., Winer, K., Street, R. A. (1989) Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma. Applied Physics Letters, 54 (19). 1872-1874 doi:10.1063/1.101264
In(1989, May) Applied Physics Letters Vol. 54 (19) AIP Publishing

See Also

These are possibly similar items as determined by title/reference text matching only.

Johnson, N.M, Street, R.A, Walker, J, Winer, K (1989) Solid-source doping of a-Si:H thin films deposited with a remote hydrogen plasma. Journal of Non-Crystalline Solids, 114. 169-171 doi:10.1016/0022-3093(89)90102-6
Johnson, N. M., Nebel, C. E., Santos, P. V., Jackson, W. B., Street, R. A., Stevens, K. S., Walker, J. (1991) Stability of hydrogenated amorphous silicon deposited at high temperatures with a remote hydrogen plasma. Applied Physics Letters, 59 (12). 1443-1445 doi:10.1063/1.105282
Johnson, N. M., Ready, S. E., Boyce, J. B., Doland, C. D., Wolff, S. H., Walker, J. (1988) Hydrogen incorporation in undoped microcrystalline silicon. Applied Physics Letters, 53 (17). 1626-1628 doi:10.1063/1.99932
Stevens, K. S., Johnson, N. M. (1992) Intrinsic stress in hydrogenated amorphous silicon deposited with a remote hydrogen plasma. Journal of Applied Physics, 71 (6). 2628-2631 doi:10.1063/1.351057
Stevens, K. S., Johnson, N. M. (1993) Erratum: ‘‘Intrinsic stress in hydrogenated amorphous silicon deposited with a remote hydrogen plasma’’ [J. Appl. Phys. 71, 2628 (1992)]. Journal of Applied Physics, 73 (9). 4727 doi:10.1063/1.354101
Johnson, N. M., Walker, J., Stevens, K. S. (1991) Characterization of a remote hydrogen plasma reactor with electron spin resonance. Journal of Applied Physics, 69 (4). 2631-2634 doi:10.1063/1.348655
Winer, K., Street, R. A., Johnson, N. M., Walker, J. (1990) Impurity incorporation and doping efficiency ina-Si:H. Physical Review B, 42 (5) 3120-3128 doi:10.1103/physrevb.42.3120
Kuiper, A. E. T., Willemsen, M. F. C., van IJzendoorn, L. J. (1988) Hydrogen incorporation in silicon (oxy)nitride thin films. Applied Physics Letters, 53 (22). 2149-2151 doi:10.1063/1.100301
Jackson, W. B., Johnson, N. M., Tsai, C. C., Wu, I.‐W., Chiang, A., Smith, D. (1992) Hydrogen diffusion in polycrystalline silicon thin films. Applied Physics Letters, 61 (14). 1670-1672 doi:10.1063/1.108446
Schauer, S. N., Flemish, J. R., Wittstruck, R., Landstrass, M. I., Plano, M. A. (1994) Phosphorus incorporation in plasma deposited diamond films. Applied Physics Letters, 64 (9). 1094-1096 doi:10.1063/1.110943
Kitahara, K., Murakami, S., Hara, A., Nakajima, K. (1998) Correlation between electron mobility and silicon-hydrogen bonding configurations in plasma-hydrogenated polycrystalline silicon thin films. Applied Physics Letters, 72 (19). 2436-2438 doi:10.1063/1.121376
 
and/or  
Mindat.org is an outreach project of the Hudson Institute of Mineralogy, a 501(c)(3) not-for-profit organization.
Copyright © mindat.org and the Hudson Institute of Mineralogy 1993-2025, except where stated. Most political location boundaries are © OpenStreetMap contributors. Mindat.org relies on the contributions of thousands of members and supporters. Founded in 2000 by Jolyon Ralph.
To cite: Ralph, J., Von Bargen, D., Martynov, P., Zhang, J., Que, X., Prabhu, A., Morrison, S. M., Li, W., Chen, W., & Ma, X. (2025). Mindat.org: The open access mineralogy database to accelerate data-intensive geoscience research. American Mineralogist, 110(6), 833–844. doi:10.2138/am-2024-9486.
Privacy Policy - Terms & Conditions - Contact Us / DMCA issues - Report a bug/vulnerability Current server date and time: August 24, 2025 21:48:32
Go to top of page