Lopes, J. M. J., Roeckerath, M., Heeg, T., Rije, E., Schubert, J., Mantl, S., Afanas’ev, V. V., Shamuilia, S., Stesmans, A., Jia, Y., Schlom, D. G. (2006) Amorphous lanthanum lutetium oxide thin films as an alternative high-κ gate dielectric. Applied Physics Letters, 89 (22). 222902pp. doi:10.1063/1.2393156
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Amorphous lanthanum lutetium oxide thin films as an alternative high-κ gate dielectric | ||
| Journal | Applied Physics Letters | ||
| Authors | Lopes, J. M. J. | Author | |
| Roeckerath, M. | Author | ||
| Heeg, T. | Author | ||
| Rije, E. | Author | ||
| Schubert, J. | Author | ||
| Mantl, S. | Author | ||
| Afanas’ev, V. V. | Author | ||
| Shamuilia, S. | Author | ||
| Stesmans, A. | Author | ||
| Jia, Y. | Author | ||
| Schlom, D. G. | Author | ||
| Year | 2006 (November 27) | Volume | 89 |
| Issue | 22 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2393156Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8551020 | Long-form Identifier | mindat:1:5:8551020:7 |
| GUID | 0 | ||
| Full Reference | Lopes, J. M. J., Roeckerath, M., Heeg, T., Rije, E., Schubert, J., Mantl, S., Afanas’ev, V. V., Shamuilia, S., Stesmans, A., Jia, Y., Schlom, D. G. (2006) Amorphous lanthanum lutetium oxide thin films as an alternative high-κ gate dielectric. Applied Physics Letters, 89 (22). 222902pp. doi:10.1063/1.2393156 | ||
| Plain Text | Lopes, J. M. J., Roeckerath, M., Heeg, T., Rije, E., Schubert, J., Mantl, S., Afanas’ev, V. V., Shamuilia, S., Stesmans, A., Jia, Y., Schlom, D. G. (2006) Amorphous lanthanum lutetium oxide thin films as an alternative high-κ gate dielectric. Applied Physics Letters, 89 (22). 222902pp. doi:10.1063/1.2393156 | ||
| In | (2006, November) Applied Physics Letters Vol. 89 (22) AIP Publishing | ||
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