Yoon, Joo-Won, Ohmi, Shun-ichiro, Park, Byung-Eun, Ishiwara, Hiroshi (2008) Impact of Kr gas mixing in oxygen plasma etching of ferroelectric poly(vinylidene fluoride-trifluoroethylene) copolymer films. Applied Physics Letters, 93 (16). 162904pp. doi:10.1063/1.2970085
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Impact of Kr gas mixing in oxygen plasma etching of ferroelectric poly(vinylidene fluoride-trifluoroethylene) copolymer films | ||
Journal | Applied Physics Letters | ||
Authors | Yoon, Joo-Won | Author | |
Ohmi, Shun-ichiro | Author | ||
Park, Byung-Eun | Author | ||
Ishiwara, Hiroshi | Author | ||
Year | 2008 (October 20) | Volume | 93 |
Issue | 16 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.2970085Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8568145 | Long-form Identifier | mindat:1:5:8568145:3 |
GUID | 0 | ||
Full Reference | Yoon, Joo-Won, Ohmi, Shun-ichiro, Park, Byung-Eun, Ishiwara, Hiroshi (2008) Impact of Kr gas mixing in oxygen plasma etching of ferroelectric poly(vinylidene fluoride-trifluoroethylene) copolymer films. Applied Physics Letters, 93 (16). 162904pp. doi:10.1063/1.2970085 | ||
Plain Text | Yoon, Joo-Won, Ohmi, Shun-ichiro, Park, Byung-Eun, Ishiwara, Hiroshi (2008) Impact of Kr gas mixing in oxygen plasma etching of ferroelectric poly(vinylidene fluoride-trifluoroethylene) copolymer films. Applied Physics Letters, 93 (16). 162904pp. doi:10.1063/1.2970085 | ||
In | (2008, October) Applied Physics Letters Vol. 93 (16) AIP Publishing |
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