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Rios, S., Karaman, I., Zhang, X. (2010) Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films. Applied Physics Letters, 96 (17). 173102pp. doi:10.1063/1.3407670

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Reference TypeJournal (article/letter/editorial)
TitleCrystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films
JournalApplied Physics Letters
AuthorsRios, S.Author
Karaman, I.Author
Zhang, X.Author
Year2010 (April 26)Volume96
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.3407670Search in ResearchGate
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Mindat Ref. ID8583088Long-form Identifiermindat:1:5:8583088:2
GUID0
Full ReferenceRios, S., Karaman, I., Zhang, X. (2010) Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films. Applied Physics Letters, 96 (17). 173102pp. doi:10.1063/1.3407670
Plain TextRios, S., Karaman, I., Zhang, X. (2010) Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films. Applied Physics Letters, 96 (17). 173102pp. doi:10.1063/1.3407670
In(2010, April) Applied Physics Letters Vol. 96 (17) AIP Publishing

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Rios, S., Bufford, D., Karaman, I., Wang, H., Zhang, X. (2013) Magnetic field induced phase transformation in polycrystalline NiCoMnAl thin films. Applied Physics Letters, 103 (13). 132404pp. doi:10.1063/1.4821945
Sawaguchi, Takahiro, Sato, M., Ishida, A. (2002) Sputter-Deposited TiZrNi High-Temperature Shape-Memory Thin Films. Materials Science Forum, 394. 499-502 doi:10.4028/www.scientific.net/msf.394-395.499
Cho, Hiroki, Kim, Jae Il, Kim, Hee Young, Miyazaki, Shuichi (2005) Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films. Journal of the Japan Institute of Metals, 69 (8). 614-621 doi:10.2320/jinstmet.69.614
Miyazaki, S, Ishida, A (1999) Martensitic transformation and shape memory behavior in sputter-deposited TiNi-base thin films. Materials Science and Engineering: A, 273. 106-133 doi:10.1016/s0921-5093(99)00292-0
Kajiwara, S., Ogawa, K., Kikuchi, T., Matsunaga, T., Miyazaki, S. (1997) Unique crystallization process in sputter-deposited ti-ni shape memory films. Materials Science and Engineering: A, 226. 53-55 doi:10.1016/s0921-5093(96)10588-8
Ma, Y., Zink, M., Mayr, S. G. (2010) Biocompatibility of single crystalline Fe70Pd30 ferromagnetic shape memory films. Applied Physics Letters, 96 (21). 213703pp. doi:10.1063/1.3435260
Jeong, Tae H., Kim, Myong R., Seo, Hun, Kim, Sang J., Kim, Sang Y. (1999) Crystallization behavior of sputter-deposited amorphous Ge2Sb2Te5 thin films. Journal of Applied Physics, 86 (2). 774-778 doi:10.1063/1.370803
Weerasekera, I. A., Shah, S. Ismat, Baxter, David V., Unruh, K. M. (1994) Structure and stability of sputter deposited beta‐tungsten thin films. Applied Physics Letters, 64 (24). 3231-3233 doi:10.1063/1.111318
(2010) Crystallization behavior of amorphous Alx(Ge2Sb2Te5)1−x thin films. Journal of Applied Physics, 108 (6). 64515pp. doi:10.1063/1.3471799
Mohanchandra, K.P., Ho, Ken K., Carman, Greg P. (2008) Compositional uniformity in sputter-deposited NiTi shape memory alloy thin films. Materials Letters, 62. 3481-3483 doi:10.1016/j.matlet.2008.03.028
Bals, S., Van Tendeloo, G., Salluzzo, M., Maggio-Aprile, I. (2001) Why are sputter deposited Nd1+xBa2−xCu3O7−δ thin films flatter than NdBa2Cu3O7−δ films?. Applied Physics Letters, 79 (22). 3660-3662 doi:10.1063/1.1421622
 
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