Timm, R., Fian, A., Hjort, M., Thelander, C., Lind, E., Andersen, J. N., Wernersson, L.-E., Mikkelsen, A. (2010) Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2. Applied Physics Letters, 97 (13). 132904pp. doi:10.1063/1.3495776
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2 | ||
| Journal | Applied Physics Letters | ||
| Authors | Timm, R. | Author | |
| Fian, A. | Author | ||
| Hjort, M. | Author | ||
| Thelander, C. | Author | ||
| Lind, E. | Author | ||
| Andersen, J. N. | Author | ||
| Wernersson, L.-E. | Author | ||
| Mikkelsen, A. | Author | ||
| Year | 2010 (September 27) | Volume | 97 |
| Issue | 13 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.3495776Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8586912 | Long-form Identifier | mindat:1:5:8586912:1 |
| GUID | 0 | ||
| Full Reference | Timm, R., Fian, A., Hjort, M., Thelander, C., Lind, E., Andersen, J. N., Wernersson, L.-E., Mikkelsen, A. (2010) Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2. Applied Physics Letters, 97 (13). 132904pp. doi:10.1063/1.3495776 | ||
| Plain Text | Timm, R., Fian, A., Hjort, M., Thelander, C., Lind, E., Andersen, J. N., Wernersson, L.-E., Mikkelsen, A. (2010) Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2. Applied Physics Letters, 97 (13). 132904pp. doi:10.1063/1.3495776 | ||
| In | (2010, September) Applied Physics Letters Vol. 97 (13) AIP Publishing | ||
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