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Kolíbal, Miroslav, Vystavěl, Tomáš, Novák, Libor, Mach, Jindřich, Šikola, Tomáš (2011) In-situ observation of 〈110〉 oriented Ge nanowire growth and associated collector droplet behavior. Applied Physics Letters, 99 (14). 143113pp. doi:10.1063/1.3647774

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Reference TypeJournal (article/letter/editorial)
TitleIn-situ observation of 〈110〉 oriented Ge nanowire growth and associated collector droplet behavior
JournalApplied Physics Letters
AuthorsKolíbal, MiroslavAuthor
Vystavěl, TomášAuthor
Novák, LiborAuthor
Mach, JindřichAuthor
Šikola, TomášAuthor
Year2011 (October 3)Volume99
Issue14
PublisherAIP Publishing
DOIdoi:10.1063/1.3647774Search in ResearchGate
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Mindat Ref. ID8596475Long-form Identifiermindat:1:5:8596475:4
GUID0
Full ReferenceKolíbal, Miroslav, Vystavěl, Tomáš, Novák, Libor, Mach, Jindřich, Šikola, Tomáš (2011) In-situ observation of 〈110〉 oriented Ge nanowire growth and associated collector droplet behavior. Applied Physics Letters, 99 (14). 143113pp. doi:10.1063/1.3647774
Plain TextKolíbal, Miroslav, Vystavěl, Tomáš, Novák, Libor, Mach, Jindřich, Šikola, Tomáš (2011) In-situ observation of 〈110〉 oriented Ge nanowire growth and associated collector droplet behavior. Applied Physics Letters, 99 (14). 143113pp. doi:10.1063/1.3647774
In(2011, October) Applied Physics Letters Vol. 99 (14) AIP Publishing

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Kolíbal, Miroslav, Kalousek, Radek, Vystavěl, Tomáš, Novák, Libor, Šikola, Tomáš (2012) Controlled faceting in 〈110〉 germanium nanowire growth by switching between vapor-liquid-solid and vapor-solid-solid growth. Applied Physics Letters, 100 (20). 203102pp. doi:10.1063/1.4714765
Kolíbal, Miroslav, Pejchal, Tomáš, Novák, Libor, Vystavěl, Tomáš, šikola, Tomáš (2016) The synergic effect of atomic hydrogen and catalyst spreading on Ge nanowire growth orientation and kinking. Microscopy and Microanalysis, 22. 732-733 doi:10.1017/s1431927616004517
Vystavel, T., Novák, L., Wandrol, P., Kolíbal, M., Mach, J., Šikola, T. (2012) In-situ SEM observation of ⟨110⟩ oriented Ge nanowire growth. Microscopy and Microanalysis, 18. 1082-1083 doi:10.1017/s143192761200726x
Kolíbal, Miroslav, Novák, Libor, Shanley, Toby, Toth, Milos, Šikola, Tomáš (2016) Silicon oxide nanowire growth mechanisms revealed by real-time electron microscopy. Nanoscale, 8. 266-275 doi:10.1039/c5nr05152e
Čechal, Jan, Tomanec, Ondřej, Škoda, David, Koňáková, Kateřina, Hrnčíř, Tomáš, Mach, Jindřich, Kolíbal, Miroslav, Šikola, Tomáš (2009) Selective growth of Co islands on ion beam induced nucleation centers in a native SiO2 film. Journal of Applied Physics, 105 (8). 84314pp. doi:10.1063/1.3116188
Novák, Libor, Wu, Min, Wandrol, Petr, Kolíbal, Miroslav, Vystavěl, Tomáš (2017) New approaches to in-situ heating in FIB/SEM systems. Microscopy and Microanalysis, 23. 928-929 doi:10.1017/s143192761700530x
Mach, Jindřich, Šamořil, Tomáš, Kolíbal, Miroslav, Zlámal, Jakub, Voborny, Stanislav, Bartošík, Miroslav, Šikola, Tomáš (2014) Optimization of ion-atomic beam source for deposition of GaN ultrathin films. Review of Scientific Instruments, 85 (8). 83302pp. doi:10.1063/1.4892800
Druckmüllerová, Zdena, Kolíbal, Miroslav, Vystavěl, Tomáš, Šikola, Tomáš (2014) Toward Site-Specific Dopant Contrast in Scanning Electron Microscopy. Microscopy and Microanalysis, 20 (4). 1312-1317 doi:10.1017/s1431927614000968
Mach, Jindřich, Šamořil, Tomáš, Voborný, Stanislav, Kolíbal, Miroslav, Zlámal, Jakub, Spousta, Jiří, Dittrichová, Libuše, Šikola, Tomáš (2011) An ultra-low energy (30–200 eV) ion-atomic beam source for ion-beam-assisted deposition in ultrahigh vacuum. Review of Scientific Instruments, 82 (8). 83302pp. doi:10.1063/1.3622749
Mach, Jindřich, Čechal, Jan, Kolíbal, Miroslav, Potoček, Michal, Šikola, Tomáš (2008) Atomic hydrogen induced gallium nanocluster formation on the Si(100) surface. Surface Science, 602 (10). 1898-1902 doi:10.1016/j.susc.2008.03.038
Kolíbal, Miroslav, Bukvišová, Kristýna, Kachtík, Lukáš, Zak, Alla, Novák, Libor, Šikola, Tomáš (2019) Formation of Tungsten Oxide Nanowires by Electron-Beam-Enhanced Oxidation of WS2 Nanotubes and Platelets. The Journal of Physical Chemistry C, 123 (14). 9552-9559 doi:10.1021/acs.jpcc.9b00592
 
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