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Kim, Dong-Gyu, Lee, Tae-Kwon, Park, Kwon-Shik, Chang, Youn-Gyoung, Han, Kyong-Joo, Choi, Duck-Kyun (2020) Hydrogen behavior under X-ray irradiation for a-IGZO thin film transistors. Applied Physics Letters, 116 (1). 13502pp. doi:10.1063/1.5132372

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Reference TypeJournal (article/letter/editorial)
TitleHydrogen behavior under X-ray irradiation for a-IGZO thin film transistors
JournalApplied Physics Letters
AuthorsKim, Dong-GyuAuthor
Lee, Tae-KwonAuthor
Park, Kwon-ShikAuthor
Chang, Youn-GyoungAuthor
Han, Kyong-JooAuthor
Choi, Duck-KyunAuthor
Year2020 (January 6)Volume116
Issue1
PublisherAIP Publishing
DOIdoi:10.1063/1.5132372Search in ResearchGate
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Mindat Ref. ID8659999Long-form Identifiermindat:1:5:8659999:1
GUID0
Full ReferenceKim, Dong-Gyu, Lee, Tae-Kwon, Park, Kwon-Shik, Chang, Youn-Gyoung, Han, Kyong-Joo, Choi, Duck-Kyun (2020) Hydrogen behavior under X-ray irradiation for a-IGZO thin film transistors. Applied Physics Letters, 116 (1). 13502pp. doi:10.1063/1.5132372
Plain TextKim, Dong-Gyu, Lee, Tae-Kwon, Park, Kwon-Shik, Chang, Youn-Gyoung, Han, Kyong-Joo, Choi, Duck-Kyun (2020) Hydrogen behavior under X-ray irradiation for a-IGZO thin film transistors. Applied Physics Letters, 116 (1). 13502pp. doi:10.1063/1.5132372
In(2020, January) Applied Physics Letters Vol. 116 (1) AIP Publishing

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