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Voitsekhovskii, A. V., Nesmelov, S. N., Dzyadukh, S. M., Varavin, V. S., Dvoretskii, S. A., Mikhailov, N. N., Sidorov, Yu. G., Vasil’ev, V. V., Yakushev, M. V. (2010) Electrophysical characteristics of MIS structures based on graded band-gap MBE HgCdTe with grown in situ CdTe as a dielectric. Russian Physics Journal, 53 (2). 148-154 doi:10.1007/s11182-010-9399-9

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Reference TypeJournal (article/letter/editorial)
TitleElectrophysical characteristics of MIS structures based on graded band-gap MBE HgCdTe with grown in situ CdTe as a dielectric
JournalRussian Physics Journal
AuthorsVoitsekhovskii, A. V.Author
Nesmelov, S. N.Author
Dzyadukh, S. M.Author
Varavin, V. S.Author
Dvoretskii, S. A.Author
Mikhailov, N. N.Author
Sidorov, Yu. G.Author
Vasil’ev, V. V.Author
Yakushev, M. V.Author
Year2010 (July)Volume53
Issue2
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s11182-010-9399-9Search in ResearchGate
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Mindat Ref. ID9035306Long-form Identifiermindat:1:5:9035306:8
GUID0
Full ReferenceVoitsekhovskii, A. V., Nesmelov, S. N., Dzyadukh, S. M., Varavin, V. S., Dvoretskii, S. A., Mikhailov, N. N., Sidorov, Yu. G., Vasil’ev, V. V., Yakushev, M. V. (2010) Electrophysical characteristics of MIS structures based on graded band-gap MBE HgCdTe with grown in situ CdTe as a dielectric. Russian Physics Journal, 53 (2). 148-154 doi:10.1007/s11182-010-9399-9
Plain TextVoitsekhovskii, A. V., Nesmelov, S. N., Dzyadukh, S. M., Varavin, V. S., Dvoretskii, S. A., Mikhailov, N. N., Sidorov, Yu. G., Vasil’ev, V. V., Yakushev, M. V. (2010) Electrophysical characteristics of MIS structures based on graded band-gap MBE HgCdTe with grown in situ CdTe as a dielectric. Russian Physics Journal, 53 (2). 148-154 doi:10.1007/s11182-010-9399-9
In(2010, July) Russian Physics Journal Vol. 53 (2) Springer Science and Business Media LLC


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