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Elers, Kai-Erik, Ritala, Mikko, Leskelä, Markku, Rauhala, Eero (1994) NbCl5 as a precursor in atomic layer epitaxy. Applied Surface Science, 82. 468-474 doi:10.1016/0169-4332(94)90260-7

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Reference TypeJournal (article/letter/editorial)
TitleNbCl5 as a precursor in atomic layer epitaxy
JournalApplied Surface Science
AuthorsElers, Kai-ErikAuthor
Ritala, MikkoAuthor
Leskelä, MarkkuAuthor
Rauhala, EeroAuthor
Year1994 (December)Volume82
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(94)90260-7Search in ResearchGate
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Mindat Ref. ID9897410Long-form Identifiermindat:1:5:9897410:4
GUID0
Full ReferenceElers, Kai-Erik, Ritala, Mikko, Leskelä, Markku, Rauhala, Eero (1994) NbCl5 as a precursor in atomic layer epitaxy. Applied Surface Science, 82. 468-474 doi:10.1016/0169-4332(94)90260-7
Plain TextElers, Kai-Erik, Ritala, Mikko, Leskelä, Markku, Rauhala, Eero (1994) NbCl5 as a precursor in atomic layer epitaxy. Applied Surface Science, 82. 468-474 doi:10.1016/0169-4332(94)90260-7
In(n.d.) Applied Surface Science Vol. 82. Elsevier BV

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Ritala, Mikko, Leskelä, Markku (1994) Zirconium dioxide thin films deposited by ALE using zirconium tetrachloride as precursor. Applied Surface Science, 75. 333-340 doi:10.1016/0169-4332(94)90180-5
Asikainen, T., Ritala, M., Leskelä, M. (1994) Growth of In2S3 thin films by atomic layer epitaxy. Applied Surface Science, 82. 122-125 doi:10.1016/0169-4332(94)90206-2
Niinistö, Lauri, Leskelä, Markku (1994) Atomic layer epitaxy in the growth of complex thin film structures for electroluminescent applications. Applied Surface Science, 82. 454-459 doi:10.1016/0169-4332(94)90258-5
Ihanus, Jarkko, Ritala, Mikko, Leskelä, Markku, Rauhala, Eero (1997) ALE growth of ZnS1−xSex thin films by substituting surface sulfur with elemental selenium. Applied Surface Science, 112. 154-158 doi:10.1016/s0169-4332(96)00984-1
Ritala, Mikko, Leskela, Markku, Rauhala, Eero (1994) Atomic layer epitaxy growth of titanium dioxide thin films from titanium ethoxide. Chemistry of Materials, 6. 556-561 doi:10.1021/cm00040a035
Ritala, Mikko, Asikainen, Timo, Leskelä, Markku, Jokinen, Janne, Lappalainen, Reijo, Utriainen, Mikko, Niinistö, Lauri, Ristolainen, Eero (1997) Effects of intermediate zinc pulses on properties of TiN and NbN films deposited by atomic layer epitaxy. Applied Surface Science, 120. 199-212 doi:10.1016/s0169-4332(97)00387-5
Asikainen, Timo, Ritala, Mikko, Leskelä, Markku, Prohaska, Thomas, Friedbacher, Gernot, Grasserbauer, Manfred (1996) AFM and STM studies on In2O3 and ITO thin films deposited by atomic layer epitaxy. Applied Surface Science, 99. 91-98 doi:10.1016/0169-4332(96)00110-9
Aarik, Jaan, Aidla, Aleks, Uustare, Teet, Ritala, Mikko, Leskelä, Markku (2000) Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process. Applied Surface Science, 161. 385-395 doi:10.1016/s0169-4332(00)00274-9
Lindroos, Seppo, Kanniainen, Tapio, Leskelä, Markku (1994) Growth of ZnS thin films by liquid-phase atomic layer epitaxy (LPALE). Applied Surface Science, 75. 70-74 doi:10.1016/0169-4332(94)90138-4
Aarik, J., Aidla, A., Jaek, A., Leskelä, M., Niinistö, L. (1994) Precursor properties of calcium β-diketonate in vapor phase atomic layer epitaxy. Applied Surface Science, 75. 33-38 doi:10.1016/0169-4332(94)90132-5
Ihanus, Jarkko, Ritala, Mikko, Leskelä, Markku, Prohaska, Thomas, Resch, Roland, Friedbacher, Gernot, Grasserbauer, Manfred (1997) AFM studies on ZnS thin films grown by atomic layer epitaxy. Applied Surface Science, 120. 43-50 doi:10.1016/s0169-4332(97)00226-2
 
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