Reference Type | Journal (article/letter/editorial) |
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Title | Growth of ZnSe thin films by radical assisted MOCVD method |
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Journal | Applied Surface Science |
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Authors | Aoki, T. | Author |
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Morita, M. | Author |
Wickramanayaka, S. | Author |
Nakanishi, Y. | Author |
Hatanaka, Y. | Author |
Year | 1996 (February) | Volume | 92 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/0169-4332(95)00216-2Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 9897946 | Long-form Identifier | mindat:1:5:9897946:4 |
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GUID | 0 |
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Full Reference | Aoki, T., Morita, M., Wickramanayaka, S., Nakanishi, Y., Hatanaka, Y. (1996) Growth of ZnSe thin films by radical assisted MOCVD method. Applied Surface Science, 92. 132-137 doi:10.1016/0169-4332(95)00216-2 |
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Plain Text | Aoki, T., Morita, M., Wickramanayaka, S., Nakanishi, Y., Hatanaka, Y. (1996) Growth of ZnSe thin films by radical assisted MOCVD method. Applied Surface Science, 92. 132-137 doi:10.1016/0169-4332(95)00216-2 |
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In | (n.d.) Applied Surface Science Vol. 92. Elsevier BV |
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