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Makimura, T., Murakami, K. (1996) Dynamics of silicon plume generated by laser ablation and its chemical reaction. Applied Surface Science, 96. 242-250 doi:10.1016/0169-4332(95)00428-9

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Reference TypeJournal (article/letter/editorial)
TitleDynamics of silicon plume generated by laser ablation and its chemical reaction
JournalApplied Surface Science
AuthorsMakimura, T.Author
Murakami, K.Author
Year1996 (April)Volume96
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(95)00428-9Search in ResearchGate
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Mindat Ref. ID9898207Long-form Identifiermindat:1:5:9898207:9
GUID0
Full ReferenceMakimura, T., Murakami, K. (1996) Dynamics of silicon plume generated by laser ablation and its chemical reaction. Applied Surface Science, 96. 242-250 doi:10.1016/0169-4332(95)00428-9
Plain TextMakimura, T., Murakami, K. (1996) Dynamics of silicon plume generated by laser ablation and its chemical reaction. Applied Surface Science, 96. 242-250 doi:10.1016/0169-4332(95)00428-9
In(n.d.) Applied Surface Science Vol. 96. Elsevier BV

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Murakami, K., Makimura, T., Ono, N., Sakuramoto, T., Miyashita, A., Yoda, O. (1998) Dynamics of Si plume produced by laser ablation in ambient inert gas and formation of Si nanoclusters. Applied Surface Science, 127. 368-372 doi:10.1016/s0169-4332(97)00657-0
Fuso, F., Vyacheslavov, L.N., Lorenzi, G., Allegrini, M., Arimondo, E. (1996) Optical diagnostics of the laser-target and laser-plume interaction in pulsed laser ablation. Applied Surface Science, 96. 181-185 doi:10.1016/0169-4332(95)00476-9
Niino, Hiroyuki, Yabe, Akira (1996) Surface chemical reaction of polymer film with reactive intermediates produced by laser ablation of azido compound. Applied Surface Science, 96. 572-576 doi:10.1016/0169-4332(95)00533-1
Titov, V., Smurov, I., Ignatiev, M. (1996) Erosion plume dynamics during pulsed laser alloying. Applied Surface Science, 96. 387-392 doi:10.1016/0169-4332(95)00491-2
Geohegan, David B., Puretzky, Alexander A. (1996) Laser ablation plume thermalization dynamics in background gases: combined imaging, optical absorption and emission spectroscopy, and ion probe measurements. Applied Surface Science, 96. 131-138 doi:10.1016/0169-4332(95)00421-1
Reitano, R., Baeri, P., Marino, N. (1996) Excimer laser induced thermal evaporation and ablation of silicon carbide. Applied Surface Science, 96. 302-308 doi:10.1016/0169-4332(95)00434-3
Kokai, F., Koga, Y., Heimann, R.B. (1996) Magnetic field enhanced growth of carbon cluster ions in the laser ablation plume of graphite. Applied Surface Science, 96. 261-266 doi:10.1016/0169-4332(95)00430-0
Verardi, P., Dinescu, M., Andrei, A. (1996) Characterization of ZnO thin films deposited by laser ablation in reactive atmosphere. Applied Surface Science, 96. 827-830 doi:10.1016/0169-4332(95)00591-9
Fujii, T., Inoue, S., Kannari, F. (1996) Deposition of fluoropolymer thin films containing semiconductor microcrystallites by VUV laser ablation. Applied Surface Science, 96. 621-624 doi:10.1016/0169-4332(95)00556-0
Fujii, T., Shima, H., Matsumoto, N., Kannari, F. (1996) Electrical and optical characteristics of organic thin films fabricated by laser ablation. Applied Surface Science, 96. 625-629 doi:10.1016/0169-4332(95)00564-1
Haglund, Richard F. (1996) Microscopic and mesoscopic aspects of laser-induced desorption and ablation. Applied Surface Science, 96. 1-13 doi:10.1016/0169-4332(95)00371-1
 
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