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Leggieri, G., Luches, A., Martino, M., Perrone, A., Alexandrescu, R., Barborica, A., Gyorgy, E., Mihailescu, I.N., Majni, G., Mengucci, P. (1996) Laser reactive ablation deposition of silicon carbide films. Applied Surface Science, 96. 866-869 doi:10.1016/0169-4332(95)00568-4

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Reference TypeJournal (article/letter/editorial)
TitleLaser reactive ablation deposition of silicon carbide films
JournalApplied Surface Science
AuthorsLeggieri, G.Author
Luches, A.Author
Martino, M.Author
Perrone, A.Author
Alexandrescu, R.Author
Barborica, A.Author
Gyorgy, E.Author
Mihailescu, I.N.Author
Majni, G.Author
Mengucci, P.Author
Year1996 (April)Volume96
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(95)00568-4Search in ResearchGate
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Mindat Ref. ID9898319Long-form Identifiermindat:1:5:9898319:3
GUID0
Full ReferenceLeggieri, G., Luches, A., Martino, M., Perrone, A., Alexandrescu, R., Barborica, A., Gyorgy, E., Mihailescu, I.N., Majni, G., Mengucci, P. (1996) Laser reactive ablation deposition of silicon carbide films. Applied Surface Science, 96. 866-869 doi:10.1016/0169-4332(95)00568-4
Plain TextLeggieri, G., Luches, A., Martino, M., Perrone, A., Alexandrescu, R., Barborica, A., Gyorgy, E., Mihailescu, I.N., Majni, G., Mengucci, P. (1996) Laser reactive ablation deposition of silicon carbide films. Applied Surface Science, 96. 866-869 doi:10.1016/0169-4332(95)00568-4
In(n.d.) Applied Surface Science Vol. 96. Elsevier BV

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D'Anna, E., Leggieri, G., Luches, A., Martino, M., Perrone, A., Majni, G., Mengucci, P., Alexandrescu, R., Mihailescu, I.N., Zemek, J. (1995) Excimer laser reactive ablation deposition of silicon nitride films. Applied Surface Science, 86. 170-174 doi:10.1016/0169-4332(94)00375-0
Luches, A., Leggieri, G., Martino, M., Perrone, A., Majni, G., Mengucci, P., Mihailescu, I.N. (1994) Laser reactive ablation deposition of nitride films. Applied Surface Science, 79. 244-249 doi:10.1016/0169-4332(94)90417-0
De Giorgi, M.L., Leggieri, G., Luches, A., Martino, M., Perrone, A., Zocco, A., Barucca, G., Majni, G., Gyorgy, E., Mihailescu, I.N., Popescu, M. (1998) Carbon nitride films deposited by reactive laser ablation. Applied Surface Science, 127. 481-485 doi:10.1016/s0169-4332(97)00678-8
D'Anna, E., Luches, A., Perrone, A., Acquaviva, S., Alexandrescu, R., Mihailescu, I.N., Zemek, J., Majni, G. (1996) Deposition of Cî—¸N films by reactive laser ablation. Applied Surface Science, 106. 126-131 doi:10.1016/s0169-4332(96)00374-1
D'Anna, E., Leggieri, G., Luches, A., Martino, M., Drigo, A.V., Majni, G., Mengucci, P., Mihailescu, I.N. (1990) Nitridation of titanium by multipulse excimer laser irradiation. Applied Surface Science, 46. 365-370 doi:10.1016/0169-4332(90)90171-u
D'Anna, E., Leggieri, G., Luches, A., Nassisi, V., Perrone, A., Majni, G., Mengucci, P. (1989) Silicon carbide formation with e-beam and laser pulses. Applied Surface Science, 36. 500-510 doi:10.1016/0169-4332(89)90944-6
D'Anna, E., Leggieri, G., Luches, A., Martino, M., Perrone, A., Mengucci, P., Mihailescu, I.N. (1992) Multilayer titanium nitride and silicide structures synthesized by multipulse excimer laser irradiation. Applied Surface Science, 54. 353-357 doi:10.1016/0169-4332(92)90070-e
D'ANNA, E., DE GIORGI, M. L., LEGGIERI, G., LUCHES, A., MAJNI, G., MARTINO, M., MIHAILESCU, I. N., MENGUCCI, P. (1994) Laser reactive ablation of thin nitride films. Le Journal de Physique IV, 4. doi:10.1051/jp4:1994409
D’Anna, E, Di Cristoforo, A, Fernández, M, Leggieri, G, Luches, A, Majni, G, Mengucci, P, Nanai, L (2002) Excimer laser reactive deposition of vanadium nitride thin films. Applied Surface Science, 186. 496-501 doi:10.1016/s0169-4332(01)00757-7
Caricato, A.P., Barucca, G., Di Cristoforo, A., Leggieri, G., Luches, A., Majni, G., Martino, M., Mengucci, P. (2005) Excimer pulsed laser deposition and annealing of YSZ nanometric films on Si substrates. Applied Surface Science, 248. 270-275 doi:10.1016/j.apsusc.2005.03.048
D'Anna, E., Leggieri, G., Luches, A., Nassisi, V., Perrone, A., Majni, G., Mengucci, P. (1989) Silicon carbide formation with pulsed laser and electron beams. Materials Chemistry and Physics, 23. 433-446 doi:10.1016/0254-0584(89)90085-0
 
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