Cerofolini, G.F (1998) A study of the ionic route for hydrogen terminations resulting after SiO2 etching by concentrated aqueous solutions of HF. Applied Surface Science, 133. 108-114 doi:10.1016/s0169-4332(98)00182-2
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | A study of the ionic route for hydrogen terminations resulting after SiO2 etching by concentrated aqueous solutions of HF | ||
Journal | Applied Surface Science | ||
Authors | Cerofolini, G.F | Author | |
Year | 1998 (May) | Volume | 133 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/s0169-4332(98)00182-2Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9900504 | Long-form Identifier | mindat:1:5:9900504:9 |
GUID | 0 | ||
Full Reference | Cerofolini, G.F (1998) A study of the ionic route for hydrogen terminations resulting after SiO2 etching by concentrated aqueous solutions of HF. Applied Surface Science, 133. 108-114 doi:10.1016/s0169-4332(98)00182-2 | ||
Plain Text | Cerofolini, G.F (1998) A study of the ionic route for hydrogen terminations resulting after SiO2 etching by concentrated aqueous solutions of HF. Applied Surface Science, 133. 108-114 doi:10.1016/s0169-4332(98)00182-2 | ||
In | (n.d.) Applied Surface Science Vol. 133. Elsevier BV |
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