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Aono, M, Nitta, S, Katsuno, T, Itoh, T, Nonomura, S (2000) Characterization of low dielectric constant amorphous carbon nitride films. Applied Surface Science, 159. 341-344 doi:10.1016/s0169-4332(00)00057-x

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization of low dielectric constant amorphous carbon nitride films
JournalApplied Surface Science
AuthorsAono, MAuthor
Nitta, SAuthor
Katsuno, TAuthor
Itoh, TAuthor
Nonomura, SAuthor
Year2000 (June)Volume159
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(00)00057-xSearch in ResearchGate
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Mindat Ref. ID9901897Long-form Identifiermindat:1:5:9901897:3
GUID0
Full ReferenceAono, M, Nitta, S, Katsuno, T, Itoh, T, Nonomura, S (2000) Characterization of low dielectric constant amorphous carbon nitride films. Applied Surface Science, 159. 341-344 doi:10.1016/s0169-4332(00)00057-x
Plain TextAono, M, Nitta, S, Katsuno, T, Itoh, T, Nonomura, S (2000) Characterization of low dielectric constant amorphous carbon nitride films. Applied Surface Science, 159. 341-344 doi:10.1016/s0169-4332(00)00057-x
In(n.d.) Applied Surface Science Vol. 159. Elsevier BV

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Itoh, T, Aono, M, Yoshida, S, Hattori, S, Katsuno, T, Nitta, S, Nonomura, S (2000) Structural stability for UV irradiation and dielectric properties of a-CNx films. Journal of Non-Crystalline Solids, 266. 825-829 doi:10.1016/s0022-3093(99)00953-9
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(2000) Index. Applied Surface Science, 159. 603-610 doi:10.1016/s0169-4332(00)00489-x
Tambo, T, Arakawa, T, Shimizu, A, Hori, S, Tatsuyama, C (2000) Epitaxial growth of Bi2Sr2CuOx films onto Si(001) by molecular beam epitaxy. Applied Surface Science, 159. 161-166 doi:10.1016/s0169-4332(00)00073-8
Nitta, S, Takada, N, Sugiyama, K, Itoh, T, Nonomura, S (1998) Preparation and properties of photoconductive amorphous carbon nitride a-CN films: the layer-by-layer method. Journal of Non-Crystalline Solids, 227. 655-658 doi:10.1016/s0022-3093(98)00191-4
Milne, W.I, Satynarayana, B.S, Hart, A, Robertson, J (2000) Electron emission from amorphous and nanocluster carbon films grown by the cathodic arc process. Applied Surface Science, 159. 561-566 doi:10.1016/s0169-4332(00)00091-x
Katsuno, T., Nitta, S., Habuchi, H., Stolojan, V., Silva, S. R. P. (2004) Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering. Applied Physics Letters, 85 (14). 2803-2805 doi:10.1063/1.1792384
 
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