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Narushima, Tetsuya, Itakura, Akiko N, Kurashina, Takayuki, Kawabe, Takaya, Kitajima, Masahiro (2000) Effects of surface disorder on the surface stress of Si(100) during oxidation. Applied Surface Science, 159. 25-29 doi:10.1016/s0169-4332(00)00065-9

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Reference TypeJournal (article/letter/editorial)
TitleEffects of surface disorder on the surface stress of Si(100) during oxidation
JournalApplied Surface Science
AuthorsNarushima, TetsuyaAuthor
Itakura, Akiko NAuthor
Kurashina, TakayukiAuthor
Kawabe, TakayaAuthor
Kitajima, MasahiroAuthor
Year2000 (June)Volume159
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(00)00065-9Search in ResearchGate
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Mindat Ref. ID9901905Long-form Identifiermindat:1:5:9901905:1
GUID0
Full ReferenceNarushima, Tetsuya, Itakura, Akiko N, Kurashina, Takayuki, Kawabe, Takaya, Kitajima, Masahiro (2000) Effects of surface disorder on the surface stress of Si(100) during oxidation. Applied Surface Science, 159. 25-29 doi:10.1016/s0169-4332(00)00065-9
Plain TextNarushima, Tetsuya, Itakura, Akiko N, Kurashina, Takayuki, Kawabe, Takaya, Kitajima, Masahiro (2000) Effects of surface disorder on the surface stress of Si(100) during oxidation. Applied Surface Science, 159. 25-29 doi:10.1016/s0169-4332(00)00065-9
In(n.d.) Applied Surface Science Vol. 159. Elsevier BV

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Narushima, Tetsuya, Itakura, Akiko N., Kawabe, Takaya, Kitajima, Masahiro (2001) Electron-stimulated surface stress relaxation of Si. Applied Physics Letters, 79 (5). 605-607 doi:10.1063/1.1388029
Kitajima, Masahiro, Narushima, Tetsuya, Kurashina, Takayuki, Itakura, Akiko N, Takami, Seiichi, Yamada, Aruba, Teraishi, Kazuo, Miyamoto, Akira (2013) Stress inversion from initial tensile to compressive side during ultrathin oxide growth of the Si(100) surface. Journal of Physics: Condensed Matter, 25 (35). 355007pp. doi:10.1088/0953-8984/25/35/355007
Narushima, Tetsuya, Kitajima, Masahiro, Itakura, Akiko N., Kurokawa, Akira, Ichimura, Shingo, Miki, Kazushi (2007) Etching-enhanced surface stress relaxation during initial ozone oxidation. Surface Science, 601 (5). 1384-1388 doi:10.1016/j.susc.2007.01.006
Itakura, A.N, Narushima, T, Kitajima, M, Teraishi, K, Yamada, A, Miyamoto, A (2000) Surface stress in thin oxide layer made by plasma oxidation with applying positive bias. Applied Surface Science, 159. 62-66 doi:10.1016/s0169-4332(00)00055-6
Kurokawa, Akira, Narushima, Tetsuya, Nakamura, Ken, Nonaka, Hidehiko, Ichimura, Shingo, Itakura, Akiko N., Kitajima, Masahiro (2004) Relationship between Ozone Oxidation and Stress Evolution on an H-Terminated Si Surface. Japanese Journal of Applied Physics, 43 (1) 281-286 doi:10.1143/jjap.43.281
Murayama, Misao, Nakayama, Takashi, Natori, Akiko (2000) Electronic structures and the charge transfer of Au overlayer on Si(111) surfaces. Applied Surface Science, 159. 45-49 doi:10.1016/s0169-4332(00)00125-2
Takatsuka, Toshinori, Fujiu, Masaki, Sakuraba, Masao, Matsuura, Takashi, Murota, Junichi (2000) Surface reaction of CH3SiH3 on Ge(100) and Si(100). Applied Surface Science, 162. 156-160 doi:10.1016/s0169-4332(00)00185-9
Igarashi, Shinichi, Itakura, Akiko N., Kitajima, Masahiro, Nakano, Shinsuke, Muto, Shunsuke, Tanabe, Tetsuo, Yamamoto, Hiroyuki, Hojou, Kiichi (2006) Local Oxidation Induced by Inhomogeneous Stress on Blistered Si Surface. Japanese Journal of Applied Physics, 45 (5) 4179-4182 doi:10.1143/jjap.45.4179
Fujimura, Masaaki, Inoue, Kouta, Nohira, Hiroshi, Hattori, Takeo (2000) Atomic-scale surface morphology of ultrathin thermal oxide formed on Si(100) surface. Applied Surface Science, 162. 62-68 doi:10.1016/s0169-4332(00)00171-9
Yamamoto, Tetsuya, Fukuzaki, Koichi, Kohiki, Shigemi (2000) Influence of incorporation of Na on p-type CuInS2 thin films. Applied Surface Science, 159. 345-349 doi:10.1016/s0169-4332(00)00123-9
Teramoto, Y, Watanabe, N, Fujimura, M, Nohira, H, Hattori, T (2000) Periodic changes in interface state distribution in accordance with layer-by-layer oxidation on Si(100). Applied Surface Science, 159. 67-71 doi:10.1016/s0169-4332(00)00052-0
 
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