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Toyoda, K, Hiraoka, Y.S, Naritsuka, S, Nishinaga, T (2000) Ab initio calculations on the dissociative reaction of As4 molecules. Applied Surface Science, 159. 360-367 doi:10.1016/s0169-4332(00)00079-9

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Reference TypeJournal (article/letter/editorial)
TitleAb initio calculations on the dissociative reaction of As4 molecules
JournalApplied Surface Science
AuthorsToyoda, KAuthor
Hiraoka, Y.SAuthor
Naritsuka, SAuthor
Nishinaga, TAuthor
Year2000 (June)Volume159
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(00)00079-9Search in ResearchGate
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Mindat Ref. ID9901919Long-form Identifiermindat:1:5:9901919:4
GUID0
Full ReferenceToyoda, K, Hiraoka, Y.S, Naritsuka, S, Nishinaga, T (2000) Ab initio calculations on the dissociative reaction of As4 molecules. Applied Surface Science, 159. 360-367 doi:10.1016/s0169-4332(00)00079-9
Plain TextToyoda, K, Hiraoka, Y.S, Naritsuka, S, Nishinaga, T (2000) Ab initio calculations on the dissociative reaction of As4 molecules. Applied Surface Science, 159. 360-367 doi:10.1016/s0169-4332(00)00079-9
In(n.d.) Applied Surface Science Vol. 159. Elsevier BV

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